IP Library Granted Patent US 7,803,254
Granted Patent B2
US 7,803,254 · App. 11/070,070 · Granted Sep 28, 2010

Processes for forming electronic devices and electronic devices formed by such processes

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Quick Facts
Patent No.
US 7,803,254
App. No.
11/070,070
Granted
Sep 28, 2010
Kind
B2
Abstract

A process for forming an electronic device includes forming a first layer over a substrate, wherein the first layer includes an organic layer, and depositing a second layer over the substrate after forming the first layer, wherein depositing the second layer is performed using ion beam sputtering. In another embodiment, a process for forming an electronic device includes placing a workpiece within a depositing chamber of a depositing apparatus, wherein the workpiece includes a substrate and an organic layer overlying the workpiece. The process includes generating a plasma within a plasma-generating chamber of the depositing apparatus, wherein the plasma is not in direct contact with the workpiece. The process also includes sending an ion beam from the plasma-generating chamber towards a target within the depositing chamber, wherein the target includes a material, and depositing a layer of the material over the organic layer.

Claims (12)

1. A process for forming an electronic device comprising:

forming a first layer over a substrate, wherein the first layer includes an organic layer; and

depositing a second layer over the substrate after forming the first layer, wherein depositing the second layer is performed using ion beam sputtering;

wherein the organic layer comprises an organic active layer.

2. The process of claim 1 , wherein the first layer further comprises a buffer layer, a charge-blocking layer, a charge-injection layer, a charge-transport layer, or a combination thereof.

3. The process of claim 1 , wherein the second layer includes a conductive layer.

4. The process of claim 3 , wherein:

the electronic device includes an LED having an anode and a cathode; and

the second layer is at least part of the anode or the cathode.

5. The process of claim 1 , wherein the second layer includes an inorganic layer and an insulating layer.

6. The process of claim 5 , wherein depositing the second layer comprises depositing the second layer directly onto the organic layer.

7. The process of claim 1 , wherein the organic layer is at least part of an electronic component within the electronic device.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2019
From: E. I. DU PONT DE NEMOURS AND COMPANY
To: LG CHEM, LTD.
Reel/Frame 050150/0482 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 23, 2005
From: PRAKASH, SHIVA
To: E. I. DU PONT DE NEMOURS AND COMPANY
Reel/Frame 016049/0832 →