IP Library Granted Patent US 7,259,951
Granted Patent B2
US 7,259,951 · App. 11/075,861 · Granted Aug 21, 2007

Semiconductor device

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,259,951
App. No.
11/075,861
Granted
Aug 21, 2007
Kind
B2
Abstract

A semiconductor device comprises an output transistor for controlling current that flows between a first terminal and a second terminal, a detection transistor connected in parallel with the output transistor, a detection resistor connected in series with the detection transistor, for detecting current that flows through the detection transistor as detection voltage and of which the resistance value is set in proportion to the potential difference between the first terminal and the second terminal and an over-current protection transistor for decreasing the ON current of the output transistor and the detection transistor according to the increase of the detection voltage.

Claims (31)

1. A semiconductor device, comprising:

an output transistor for controlling current that flows between a first terminal and a second terminal;

a detection transistor connected in parallel with the output transistor;

a detection resistor connected in series with the detection transistor, for detecting current that flows through the detection transistor as detection voltage and of which the resistance value is set in proportion to the potential difference between the first terminal and the second terminal; and

an over-current protection transistor for decreasing the ON current of the output transistor and the detection transistor according to the increase of the detection voltage.

2. The semiconductor device according to claim 1 , wherein the detection resistor is formed in the semiconductor area connected to the first terminal, and is made of a semiconductor layer containing impurities of which the conductive type is opposite the conductive type of the impurities contained in the semiconductor area.

3. The semiconductor device according to claim 2 , wherein the semiconductor layer is formed to be depleted by applying a reverse bias to a junction portion composed of the semiconductor layer and the semiconductor area.

4. The semiconductor device according to claim 1 , further comprising a fixed resistor which is connected in parallel with the detection resistor and of which the resistance value is fixed.

5. The semiconductor device according to claim 1 , wherein the output transistor is a field effect transistor, the first terminal is a drain terminal, and the second terminal is a source terminal.

6. The semiconductor device according to claim 1 , wherein the output transistor and the detection transistor are vertical type field effect transistors.

7. The semiconductor device according to claim 1 , wherein the output transistor and the detection transistor are vertical type field effect transistors having a gate electrode with a trench structure.

8. A semiconductor device, comprising:

a drive circuit for controlling drive current that flows through a load;

a detection resistor to which detection current for detecting the drive current is supplied and of which the resistance value changes based on a predetermined potential of the drive circuit on a route where the drive current flows; and

a control circuit for controlling the drive status of the drive circuit based on the voltage of the detection resistor.

9. The semiconductor device according to claim 8 , wherein the detection resistor is formed by stacking a first semiconductor layer and a second semiconductor layer, the resistance value of the detection resistor is a resistance value of the first semiconductor layer, and the predetermined potential is supplied to the second semiconductor layer.

10. The semiconductor device according to claim 9 , wherein the second semiconductor layer is formed by stacking a semiconductor layer of which the impurity density is high and a semiconductor layer of which the impurity density is low, the first semiconductor layer is adjacent to the low density semiconductor layer side and the predetermined potential is supplied to the high density semiconductor layer side.

11. The semiconductor device according to claim 8 , wherein the first semiconductor layer is a p-type semiconductor layer and the second semiconductor layer is an n-type semiconductor layer.

12. The semiconductor device according to claim 8 , further comprising a resistor which is connected in parallel with the detection resistor and of which the resistance value is fixed.

13. The semiconductor device according to claim 8 , wherein the drive circuit is a vertical type field effect transistor.

14. A semiconductor device, comprising:

an output transistor of which drain is connected to a first power supply via a load and source is connected to a second power supply;

a detection transistor of which drain is connected to the drain of said output transistor and gate is connected to the gate of the output transistor;

a detection resistor of which one end is connected to the source of the detection transistor and the other end is connected to the source of the output transistor, and of which resistance value changes based on the drain voltage of the output transistor; and

an over-current protection transistor of which drain is connected to the gate of the output transistor, source is connected to the source of the output transistor, and gate is connected to the source of the detection transistor.

15. The semiconductor device according to claim 14 , wherein the detection resistor further comprises:

an n-type semiconductor layer of which the impurity density is high;

an n-type semiconductor layer which is formed on the high density n-type semiconductor layer, and of which the impurity density is low; and

a p-type semiconductor layer which is formed on the low density n-type semiconductor layer.

16. The semiconductor device according to claim 15 , wherein the high density n-type semiconductor layer is connected to the drain of the output transistor, and the resistance value of the p-type semiconductor layer is the resistance value of the detection resistor.

17. The semiconductor device according to claim 14 , further comprising a resistor which is connected in parallel with the detector resistor.

Assignments (2)
CHANGE OF NAME Recorded Nov 11, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025346/0859 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2005
From: ARAI, TAKAO
To: NEC ELECTRONICS CORPORATION
Reel/Frame 016375/0610 →