Semiconductor device having a refractory metal containing film and method for manufacturing the same
View Patent ↗A semiconductor device and a method for manufacturing the same of the present invention in which the semiconductor device is provided with a fuse structure or an electrode pad structure, suppress the copper blowing-out from a copper containing metal film. The semiconductor device comprises a silicon substrate, SiO 2 film provided on the silicon substrate, copper films embedded in the SiO 2 film, TiN films covering an upper face of a boundary region between an upper face of copper films and the copper films, and the SiO 2 film, and SiON films covering an upper face of the TiN films.
1. A semiconductor device comprising:
a semiconductor substrate;
a first insulating film provided on said semiconductor substrate;
a copper containing metal film embedded in said first insulating film;
a refractory metal containing film covering an upper portion of said copper containing metal film, and an upper portion of a boundary portion between said copper containing metal film and said first insulating film; and
a second insulating film covering substantially only an upper face of said refractory metal containing film.
2. The semiconductor device according to claim 1 , wherein said second insulating film includes a silicon nitride film, a silicon oxide film or a silicon oxynitride film.
3. The semiconductor device according to claim 1 , wherein said refractory metal containing film is made of at least one material selected from the group consisting of Ti, TiN, Ta, TaN, W, Mo, Cr and Ni.
4. The semiconductor device according to claim 1 , wherein said second insulating film is not less than 0.01 μm and not more than 1 μm in connection with its film thickness.
5. The semiconductor device according to claim 1 , wherein said refractory metal containing film is not less than 0.1 μm and not more than 0.3 μm in connection with its film thickness.
6. The semiconductor device according to claim 1 , further comprising a third insulating film, which is provided on said first insulating film and said second insulating film.
7. The semiconductor device according to claim 6 , wherein said third insulating film is made of at least one material selected from the group consisting of silicon nitride, silicon oxide and silicon oxynitride.
8. The semiconductor device according to claim 1 , wherein said refractory metal containing film is a fuse wiring, and said copper containing metal film is a fuse electrode.
9. A semiconductor device comprising:
a semiconductor substrate;
a first insulating film provided on said semiconductor substrate;
a refractory metal containing film having a predetermined pattern provided on said first insulating film;
a second insulating film provided substantially only on an upper face of said refractory metal containing film; and
a third insulating film provided on said first insulating film and said second insulating film,
wherein a sum of a thickness of said second insulating film on said refractory metal containing film and a thickness of said third insulating film is larger than a thickness of said third insulating film on said first insulating film.
10. The semiconductor device according to claim 9 , wherein said refractory metal containing film is made of at least one material selected from the group consisting of Ti, TiN, Ta, TaN, W, Mo, Cr and Ni.
11. The semiconductor device according to claim 9 , wherein said second insulating film includes a silicon nitride film, a silicon oxide film or a silicon oxynitride film.
12. The semiconductor device according to claim 9 , wherein said third insulating film includes a silicon nitride film, a silicon oxide film or a silicon oxynitride film.
13. The semiconductor device according to claim 9 , wherein said refractory metal containing film composes an alignment mark.
14. A semiconductor device comprising:
a semiconductor substrate;
a first insulating film provided on said semiconductor substrate;
a refractory metal containing film having a predetermined pattern provided on said first insulating film; and
a second insulating film provided on said first insulating film and said refractory metal containing film,
wherein a thickness of said second insulating film on said refractory metal containing film is larger than a thickness of said second insulating film on said first insulating film.
15. The semiconductor device according to claim 14 , wherein said refractory metal containing film composes an alignment mark.
16. The semiconductor device according to claim 1 , further comprising a third insulating film on said first insulating film and said second insulating film, wherein a sum of a thickness of said second insulating film on said refractory metal containing film and a thickness of said third insulating film is larger than a thickness of said third insulating film on said first insulating film.
17. The semiconductor device according to claim 1 , wherein a thickness of said second insulating film on said refractory metal containing film is larger than a thickness of said second insulating film on said first insulating film.
18. The semiconductor device according to claim 14 , wherein said second insulating film covers substantially only an upper face of said refractory metal containing film.