IP Library Granted Patent US 7,014,785
Granted Patent B2
US 7,014,785 · App. 11/082,986 · Granted Mar 21, 2006

Method of fabricating inkjet nozzle

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Quick Facts
Patent No.
US 7,014,785
App. No.
11/082,986
Granted
Mar 21, 2006
Kind
B2
Abstract

A method of fabricating an inkjet nozzle on a wafer substrate is provided. The nozzle comprises a nozzle chamber, an actuator and control circuitry for controlling the actuator. The method comprises the steps of: (a) providing a wafer substrate having control circuitry formed thereon; (b) depositing first sacrificial material on the wafer; (c) forming the actuator on the first sacrificial layer such that the actuator electrically connects with the control circuitry; (d) depositing second sacrificial material over the actuator; (e) defining openings in the second sacrificial material, the openings defining the positions of chamber sidewalls; (f) depositing roof material over the second sacrificial material and into the openings; (g) defining an aperture in the roof material; and (h) removing the first and second sacrificial materials.

Claims (18)

1. A method of fabricating an inkjet nozzle on a wafer substrate, the nozzle comprising:

a nozzle chamber, the nozzle chamber including a roof having an aperture defined therein, and sidewalls extending from the roof to the substrate

an actuator positioned in the nozzle chamber for ejecting ink through the aperture; and

control circuitry for controlling the actuator, the method comprising the steps of:

(a) providing a wafer substrate having control circuitry formed thereon;

(b) depositing first sacrificial material on the wafer;

(c) forming the actuator on the first sacrificial layer such that the actuator electrically connects with the control circuitry;

(d) depositing second sacrificial material over the actuator;

(e) defining openings in the second sacrificial material, the openings defining the positions of chamber sidewalls;

(f) depositing roof material over the second sacrificial material and into the openings;

(g) defining an aperture in the roof material; and

(h) removing the first and second sacrificial materials.

2. The method of claim 1 , wherein the control circuitry is formed by a CMOS process.

3. The method of claim 1 , wherein the actuator is a thermal actuator.

4. The method of claim 1 , wherein the roof material is deposited by PECVD.

5. The method of claim 1 , wherein an ink supply channel is back-etched to the nozzle prior to removing the sacrificial material.

6. The method of claim 1 , wherein a plurality of nozzles are formed on the wafer substrate.

7. The method of claim 1 , which forms part of a printhead fabrication process.

Assignments (2)
CHANGE OF NAME Recorded Jun 25, 2014
From: ZAMTEC LIMITED
To: MEMJET TECHNOLOGY LIMITED
Reel/Frame 033244/0276 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2012
From: SILVERBROOK RESEARCH PTY. LIMITED AND CLAMATE PTY LIMITED
To: ZAMTEC LIMITED
Reel/Frame 028542/0952 →