Apparatus for coating photoresist having slit nozzle

1. An apparatus for coating a photoresist onto a substrate, comprising:

a slit nozzle to apply the photoresist to the substrate;

a slit nozzle driving unit to move the slit nozzle; and

a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line, wherein the photoresist supply unit integrally moves with the slit nozzle.

2. The apparatus of claim 1 , wherein the photoresist supply unit is directly connected to the slit nozzle.

3. The apparatus of claim 2 , wherein the photoresist supply unit and the slit nozzle are connected to each other with a vibration preventing unit interposed therebetween.

4. The apparatus of claim 1 , wherein the photoresist supply unit is connected to the slit nozzle by a connection portion.

5. The apparatus of claim 4 , wherein the photoresist moves from the photoresist supply unit to the slit nozzle through the connection portion.

6. The apparatus of claim 4 , further comprising:

a support unit to support the photoresist supply unit, the photoresist supply unit being separated from the slit nozzle by a predetermined distance.

7. The apparatus of claim 4 , wherein the photoresist supply unit is adjacent to the slit nozzle with the connection portion interposed therebetween.

8. The apparatus of claim 1 , wherein the slit nozzle driving unit includes a pair of slit driving units disposed on opposing sides of the substrate.

9. The apparatus of claim 8 , wherein the slit nozzle has a bar shape disposed across the substrate and supported by the pair of slit nozzle driving units.

10. The apparatus of claim 1 , wherein the photoresist supply unit discharges and receives photoresist at the same time.

11. The apparatus of claim 1 , wherein the slit nozzle includes a cavity to temporarily store the photoresist and a photoresist ejector to eject the photoresist, the cavity having a dimension greater than that of the photoresist ejector.

12. The apparatus of claim 11 , wherein a fluid passage connecting the cavity and the photoresist supply unit has a dimension smaller than the cavity.

13. The apparatus of claim 1 , wherein the photoresist supply unit receives photoresist from away from the slit nozzle driving unit using a photoresist supply line away.

14. An apparatus for coating a photoresist onto a substrate, comprising:

a slit nozzle to apply the photoresist to the substrate;

a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle on the substrate;

a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line; and

a support unit to support the photoresist supply unit and to separate the photoresist supply unit from the slit nozzle by a predetermined distance,

wherein the photoresist supply unit integrally moves with the slit nozzle.

15. The apparatus of claim 14 , wherein the slit nozzle includes a cavity to temporarily store the photoresist and a photoresist ejector to eject the photoresist, the cavity having a dimension greater than that of the photoresist ejector.

16. The apparatus of claim 15 , wherein a fluid passage connecting the cavity and the photoresist supply unit has a dimension smaller than the cavity.

17. An apparatus for coating a photoresist onto a substrate, comprising:

a slit nozzle to apply the photoresist to the substrate, the slit nozzle having a dispensing slit with a length greater than a width of the substrate;

a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle across the substrate; and

a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line, wherein the photoresist supply unit integrally moves with the slit nozzle.

18. The apparatus of claim 17 , wherein the slit nozzle driving unit includes a pair of slit driving units disposed on opposing sides of the substrate.

19. The apparatus of claim 17 , wherein the photoresist supply unit and the slit nozzle are connected to each other to prevent vibration from being transmitted therebetween.

20. The apparatus of claim 17 , further comprising: a support unit to support the photoresist supply unit, the photoresist supply unit being separated from the slit nozzle by a predetermined distance.

21. The apparatus of claim 17 , wherein the slit nozzle includes a cavity to temporarily store the photoresist and a photoresist ejector to eject the photoresist, the cavity having a dimension greater than that of the photoresist ejector.

22. The apparatus of claim 21 , wherein a fluid passage connecting the cavity and the photoresist supply unit has a dimension smaller than the cavity.

23. The apparatus of claim 17 , wherein the photoresist supply unit receives photoresist from away from the slit nozzle driving unit using a photoresist supply line.

24. An apparatus for coating a photoresist onto a substrate, comprising:

a slit nozzle to apply the photoresist to the substrate;

a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle on the substrate;

a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line; and

a support unit to support the photoresist supply unit and to separate the photoresist supply unit from the slit nozzle by a predetermined distance,

wherein the photoresist supply unit integrally moves with the slit nozzle.

25. The apparatus of claim 24 , wherein the photoresist supply unit prevents vibration from being transmitted to the slit nozzle.

26. The apparatus of claim 24 , wherein the photoresist supply unit is formed on the slit nozzle and is connected to the slit nozzle by a flexible connection portion so that vibration of the photoresist supply unit is prevented from being transmitted to the slit nozzle.

27. The apparatus of claim 26 , wherein the photoresist moves from the photoresist supply unit to the slit nozzle through the connection portion.

28. The apparatus of claim 24 , wherein the slit nozzle driving unit includes a pair of slit driving units disposed on opposing sides of the substrate.