Fuse and seal ring
View Patent ↗There is provided a semiconductor device excellent in reliability. The semiconductor device is comprised of a semiconductor substrate, an insulating portion having a multilayer insulating film composed of an etch stopper film, an insulating film, an etch stopper film, an insulating film, an etch stopper film and an insulating film provided on an upper portion of the semiconductor, fuses provided on the insulating portion, and a seal ring composed of a copper containing metal film, a barrier metal film, a copper containing metal film and a barrier metal film embedded in the insulating portion so as to surround a region just below the fuses.
1. A semiconductor device comprising:
a semiconductor substrate;
an insulating portion provided over said semiconductor substrate, said insulating portion having at least two separate layers of insulating film;
a fuse provided on said insulating portion;
a seal ring that is electrically isolated from said fuse and embedded in said insulating portion from a top to a bottom of said insulating portion so as to surround a region of said insulating portion just below said fuse; and
a corrosion stopper film on said seal ring, said corrosion stopper film covering an entire top surface of said seal ring in a level where said fuse is provided, said corrosion stopper film being composed of a high melting point metal film,
wherein, an inside surface of said seal ring from the top to the bottom of said insulating portion is composed of a high melting point metal.
2. The semiconductor device according to claim 1 , wherein the high melting point metal is selected from a group consisting of Ta, TaN, Ti, TiN, W, WN, Mo, Cr and Ni.
3. The semiconductor device according to claim 1 , wherein said seal ring comprises:
not less than one coppercontaining metal, and
wherein said high melting point metal is a film that covers an inside surface, an outside surface and a bottom surface of said copper-containing metal.
4. The semiconductor device according to claim 1 , wherein said fuse is composed of a high melting point metal film.
5. The semiconductor device according to claim 1 , wherein said fuse is composed of a film containing not less than one metal selected from a group consisting of Ti, TiN, Ta, TaN, W, Mo, Cr and Ni.
6. The semiconductor device according to claim 1 , further comprising a protective insulating film that covers an upper face of said fuse and includes one of a SiN film and a SiON film.
7. The semiconductor device according to claim 1 , wherein said insulating portion comprises an etch stopper film containing one of a SiN film and a SiON film between said at least two layers of insulating film.
8. The semiconductor device according to claim 1 , wherein said insulating portion comprises an etch stopper film containing one of a SiN film and a SiON film just below an uppermost of said at least two layers of insulating film.
9. The semiconductor device according to claim 1 ,
wherein said seal ring has a notch portion in plan view.
10. The semiconductor device according to claim 1 , further comprising a second said seal ring embedded in said insulating portion and surrounding said region just below said fuse.
11. The semiconductor device according to claim 1 , wherein said fuse and said corrosion stopper film are composed of the same high melting point metal film.
12. A semiconductor device comprising:
a semiconductor substrate;
an insulating portion provided over said semiconductor substrate, said insulating portion having at least two separate layers of insulating film;
a fuse provided on said insulating portion;
a seal ring that is electrically isolated from said fuse and embedded in said insulating portion from a top to a bottom of said insulating portion so as to surround a region of said insulating portion just below said fuse; and
a corrosion stopper film on said seal ring, said corrosion stopper film being in a level where said fuse is provided, said corrosion stopper film being composed of a high melting point metal film,
wherein, an inside surface of said seal ring from the top to the bottom of said insulating portion is composed of a high melting point metal, and
wherein a thickness of the high melting point metal on the inside surface of said seal ring embedded in an uppermost one of said at least two layers of insulating film is greater than a thickness of the high melting point metal on the inside surface of said seal ring embedded in a lower one of said at least two layers of insulating film.
13. A semiconductor device comprising:
a semiconductor substrate;
an insulating portion provided over said semiconductor substrate, said insulating portion having at least two separate layers of insulating film;
a fuse provided on said insulating portion;
a seal ring that is electrically isolated from said fuse and embedded in said insulating portion from a top to a bottom of said insulating portion so as to surround a region of said insulating portion just below said fuse; and
wherein, an inside surface of said seal ring from the top to the bottom of said insulating portion is composed of a high melting point metal,
wherein said seal ring has a notch portion in a plan view, and wherein, in a vicinity of outside of said notch portion of said seal ring, a part, which has the same structure as said seal ring and corresponds to a portion of said seal ring, is arranged at least so as to cover said notch portion.