Capacitive dynamic quantity sensor and semiconductor device
View Patent ↗A capacitive dynamic quantity sensor whose size is small and whose reliability and mass productivity are high is provided. In order to realize signal transmission from a lower electrode to an upper electrode, silicon columns which are electrically isolated from one another but not mechanically isolated from one another are formed to connect both electrodes.
1. A capacitive dynamic quantity sensor, comprising:
a first insulator having a first electrode formed thereon;
a second insulator having a second electrode formed thereon; and
a semiconductor having a weight formed therein, which displaces due to a dynamic quantity,
the first insulator, the semiconductor, and the second insulator being laminated,
the capacitive dynamic quantity sensor measuring the dynamic quantity based on a change in capacitance value among the weight and the first electrode, which is caused by displacement of the weight, wherein:
a column is formed in the semiconductor so that the first electrode is electrically connected with the second electrode;
the column is composed of an upper conductive portion, an intermediate insulating portion, and a lower conductive portion;
an electrical connecting means which connects the upper conductive portion with the lower conductive portion is disposed on the upper portion of the column
the upper portion of the column is not mechanically isolated from other columns; and
the electrical connecting means disposed on the upper portion of the column is electrically isolated from other electrical connecting means disposed on upper portion of other columns.
2. A capacitive dynamic quantity sensor according to claim 1 , wherein the upper portion of the column is electrically isolated from an upper portion of another column by an insulating layer provided in the semiconductor and an insulating layer formed in the upper portion of the column.
3. A capacitive dynamic quantity sensor, comprising:
a first insulator having a first electrode formed thereon;
a second insulator having a second electrode formed thereon; and
a semiconductor of a first conductivity type having a weight formed therein, which displaces due to a dynamic quantity,
the first insulator, the semiconductor, and the second insulator being laminated,
the capacitive dynamic quantity sensor measuring the dynamic quantity based on a change in capacitance value among the weight and the first electrode pattern, which is caused by displacement of the weight formed in the semiconductor, wherein:
a column is formed in the semiconductor of the first conductivity type so that the first electrode is electrically connected with the second electrode;
the column is composed of an upper conductive portion, an intermediate insulating portion, and a lower conductive portion;
an electrical connecting means which connects the upper conductive portion with the lower conductive portion is disposed on the upper portion of the column
a part of an upper portion of the column is formed from a semiconductor of a second conductivity type;
the upper portion of the column is not mechanically isolated from other columns; and
the upper portion of the column is electrically isolated by a depletion layer of a junction made of the semiconductor of the first conductivity type and the semiconductor of the second conductivity type.
4. A capacitive dynamic quantity sensor according to claim 3 , wherein the semiconductor of the first conductivity type is a P-type and the semiconductor of the second conductivity type formed in the part of the upper portion of the column is an N-type.
5. A capacitive dynamic quantity sensor according to claim 4 , wherein a potential of the semiconductor of the N-type formed in the part of the upper portion of the column is set to a voltage equal to or larger than a maximum applicable voltage to the capacitive dynamic quantity sensor through the first electrode or the second electrode.
6. A capacitive dynamic quantity sensor according to claim 3 , wherein the semiconductor of the first conductivity type is an N-type and the semiconductor of the second conductivity type formed in the part of the upper portion of the column is a P-type.
7. A capacitive dynamic quantity sensor according to claim 6 , wherein a potential of the semiconductor of the P-type formed in the part of the upper portion of the column is set to a voltage equal to or smaller than a minimum applicable voltage to the capacitive dynamic quantity sensor through the first electrode or the second electrode.