Electrostatic protection device
View Patent ↗The electrostatic protection device comprises a semiconductor substrate of a first conductivity type, a well of a second conductivity type formed on the semiconductor substrate, a first diffusion layer of the first conductivity type formed on the second conductivity type well and connected to a signal terminal, a first well of the first conductivity type formed on the semiconductor substrate, a first diffusion layer of the second conductivity type formed on the first well and connected to a ground terminal, a second well of the first conductivity type formed on the semiconductor substrate and spaced apart from the first well and a second diffusion layer of the first conductivity type formed on the second well connected to a ground terminal.
1. An electrostatic protection device for preventing breakdown of a protected circuit due to electrostatic discharge, comprising:
a semiconductor substrate of a first conductivity type;
a well of a second conductivity type formed on the semiconductor substrate;
a first diffusion layer of the first conductivity type formed on the second conductivity type well and connected to a signal terminal;
a first well of the first conductivity type formed on the semiconductor substrate;
a first diffusion layer of the second conductivity type formed on the first well and connected to a ground terminal;
a second well of the first conductivity type formed on the semiconductor substrate and spaced apart from the first well; and
a second diffusion layer of the first conductivity type formed on the second well connected to a ground terminal,
wherein a region between the first well and the second well is of the first conductivity type and has a lower impurity concentration than the first well and the second well.
2. The electrostatic protection device of claim 1 , wherein the first conductivity type is P-type, and the second conductivity type is N-type.
3. The electrostatic protection device of claim 1 , wherein a region between the first well and the second well is of the same composition as the semiconductor substrate of the first conductivity type.
4. An electrostatic protection device as in claim 1 , wherein the first diffusion of the second conductivity type is the only diffusion layer formed on the first well of the first conductivity type.
5. An electrostatic protection device as in claim 1 , wherein only diffusions of the second conductivity type are formed on the first well of the first conductivity type.
6. An electrostatic protection device as in claim 1 ,
wherein the second well of the first conductivity type is spaced apart from the first well so as to form a resistance between the first well and the second well that results in a voltage drop facilitating transistor turn-on and enabling stable thyristor operation.
7. An electrostatic protection device as in claim 1 , wherein all of the first diffusion layer of the first conductivity type, the first diffusion layer of the second conductivity type, and the second diffusion layer of the first conductivity type are disposed within one of the first well and the second well.
8. A silicon structure of an electrostatic protection device for preventing breakdown of a protected circuit due to electrostatic discharge, the silicon structure comprising:
a semiconductor substrate of a first conductivity type;
a well of a second conductivity type formed on the semiconductor substrate;
a first diffusion layer of the first conductivity type formed on the second conductivity type well and connected to a signal terminal;
a first well of the first conductivity type formed on the semiconductor substrate;
a first diffusion layer of the second conductivity type formed on the first well and connected to a ground terminal;
a second well of the first conductivity type fanned on the semiconductor substrate and separated from the first well by a structure of the first conductivity type which provides a resistance internal to the silicon structure between the first well and the second well; and
a second diffusion layer of the first conductivity type formed on the second well and connected to a ground terminal.
9. A silicon structure of an electrostatic protection device as in claim 8 , wherein the first diffusion layer of the second conductivity type is the only diffusion layer formed on the first well of the first conductivity type.
10. A silicon structure of an electrostatic protection device as in claim 8 , wherein diffusion layers only of the second conductivity type are formed on the first well of the first conductivity type.
11. A silicon structure of an electrostatic protection device as in claim 8 , wherein the resistance internal to the silicon structure results in a voltage drop facilitating transistor turn-on and enabling stable thyristor operation.
12. An electrostatic protection device for preventing breakdown of a protected circuit due to electrostatic discharge, comprising:
a semiconductor substrate of a first conductivity type;
a well of a second conductivity type formed on the semiconductor substrate;
a first diffusion layer of the first conductivity type formed on the second conductivity type well and connected to a signal terminal;
a first well of the first conductivity type formed on the semiconductor substrate;
a first diffusion layer of the second conductivity type formed on the first well and connected to a ground terminal;
a second well of the first conductivity type formed on the semiconductor substrate and spaced apart from the first well; and
a second diffusion layer of the first conductivity type formed on the second well connected to a ground terminal,
wherein the second well of the first conductivity type is spaced apart from the first well so as to form a resistance between the first well and the second well that results in a voltage drop facilitating transistor turn-on and enabling stable thyristor operation.
13. The electrostatic protection device of claim 12 , wherein the first conductivity type is P-type, and the second conductivity type is N-type.
14. The electrostatic protection device of claim 12 , wherein a region between the first well and the second well is of the first conductivity type and has a lower impurity concentration than the first well and the second well.
15. The electrostatic protection device of claim 12 , wherein a region between the first well and the second well is of the same composition as the semiconductor substrate of the first conductivity type.
16. An electrostatic protection device as in claim 12 , wherein the first diffusion of the second conductivity type is the only diffusion layer formed on the first well of the first conductivity type.
17. An electrostatic protection device as in claim 12 , wherein only diffusions of the second conductivity type are formed on the first well of the first conductivity type.