Method for fabricating cliche and method for forming pattern using the same

1. A method for fabricating a cliché comprising:

providing a transparent glass substrate;

depositing a metal layer on the substrate;

patterning the metal layer to form a first metal pattern;

etching the glass substrate using the first metal pattern as a mask, thereby forming a first convex pattern;

patterning the first metal pattern to form a second metal pattern; and

etching the first convex pattern using the second metal pattern as a mask, thereby forming a second convex pattern.

2. The method of claim 1 , wherein the second convex pattern is formed on a surface of the first convex pattern.

3. The method of claim 1 , further comprising:

applying an adhesion force intensifier on a surface of the second convex pattern.

4. The method of claim 3 , wherein the adhesion force intensifier is Hexa Methyl Disilazane (HMDS).

5. A method for fabricating a cliché comprising:

providing a transparent glass substrate;

depositing a photoresist on the substrate

forming a first photoresist pattern having a first thickness and a second photoresist pattern having a second thickness, the first and second photoresist patterns alternating with each other;

etching the glass substrate using the first photoresist pattern as a mask, thereby forming a first convex pattern; and

removing the first photoresist pattern, then etching the first convex pattern using the second photoresist pattern as a mask, thereby forming a second convex pattern.

6. The method of claim 5 , wherein the second convex pattern is formed on a surface of the first convex pattern.

7. The method of claim 5 , further comprising applying an adhesion force intensifier on a surface of the second convex pattern.

8. The method of claim 7 , wherein the adhesion force intensifier is Hexa Methyl Disilazane (HMDS).

9. A method for forming a pattern comprising:

providing a cliché having a plurality of convex patterns and a plurality of convexo concavo patterns on surfaces of the convex patterns;

forming an etching object layer on a substrate;

applying ink on the etching object layer;

attaching the cliché and the substrate to each other so that the surfaces of the convex patterns are in contact with the ink applied onto the etching object layer; and

separating the substrate and the cliché from each other, thereby forming an ink pattern that partially remains on the etching object layer.

10. The method of claim 9 , wherein the step of providing a cliché comprises:

providing a transparent glass substrate;

depositing a metal layer on the substrate;

patterning the metal layer to form a first metal pattern;

etching the glass substrate using the first metal pattern as a mask, thereby forming a first convex pattern;

patterning the first metal pattern to form a second metal pattern; and

etching the first convex pattern using the second metal pattern as a mask, thereby forming a second convex pattern on a surface of the first convex pattern.

11. The method of claim 9 , wherein the step of providing a cliché comprises:

providing a transparent glass substrate;

depositing a photoresist on the substrate

forming a first photoresist pattern having a first thickness and a second photoresist pattern having a second thickness, the first and second photoresist patterns alternating with each other;

etching the glass substrate using the first photoresist pattern as a mask, thereby forming a first convex pattern; and

removing the first photoresist pattern, then etching the first convex pattern using the second photoresist pattern as a mask, thereby forming a second convex pattern.

12. The method of claim 9 , wherein in the separating the substrate and the cliché from each other, ink that is in contact with the convex patterns of the cliché is attached to the convex patterns thereby removing the ink from the etching object layer.

13. The method of claim 9 , wherein the ink pattern formed on the etching object layer is formed at regions that are not in contact with the convex patterns of the cliché.

14. The method of claim 9 , further comprising:

hardening the ink pattern.

15. The method of claim 9 , further comprising etching the etching object layer by using the ink pattern as a mask.

16. The method of claim 14 , wherein the hardening the ink pattern comprises applying heat on the ink pattern.

17. The method of claim 14 , wherein hardening the ink pattern comprises irradiating ultraviolet rays on the ink pattern.