Photolithography method and apparatus

1 . A photolithography method in which a photosensitive material is exposed by moving an exposing section in the sub-scanning direction relative to the photosensitive material, the exposing section comprising a plurality of exposing head arrays arranged in the sub-scanning direction in an indented manner in the main scanning direction, and each array having a plurality of exposing heads for irradiating exposing light beams by receiving the exposing light beams outputted from exposing light sources,

the method comprising the steps of:

drive controlling the exposing light sources constructed to output the exposing light beams to cause the exposing light beams to be outputted to each of the exposing head arrays on an array by array basis, and

initiating the exposure of the photosensitive material by the exposing head arrays on an array by array basis in the order in which the exposing head arrays are arranged in the sub-scanning direction.

2 . A photolithography method in which a photosensitive material is exposed by moving an exposing section in the sub-scanning direction relative to the photosensitive material, the exposing section comprising a plurality of exposing head arrays arranged in the sub-scanning direction in an indented manner in the main scanning direction, and each array having a plurality of exposing heads for irradiating exposing light beams by receiving the exposing light beams outputted from exposing light sources,

the method comprising the steps of:

drive controlling the exposing light sources constructed to output the exposing light beams to cause the exposing light beams outputted to each of the exposing head arrays to be terminated on an array by array basis, and

terminating the exposure of the photosensitive material by the exposing head arrays on an array by array basis in the order in which the exposing head arrays are arranged in the sub-scanning direction.

3 . A photolithography method according to claim 1 , wherein the step of drive controlling the exposing light sources constructed to output the exposing light beams causes the exposing light beams to be outputted to the respective exposing heads on a head by head basis, and the exposing light beams are irradiated only by a range of the exposing heads corresponding to the width of the photosensitive material in the main scanning direction.

4 . A photolithography method according to claim 2 , wherein the step of drive controlling the exposing light sources constructed to output the exposing light beams causes the exposing light beams to be outputted to the respective exposing heads on a head by head basis, and the exposing light beams are irradiated only by a range of the exposing heads corresponding to the width of the photosensitive material in the main scanning direction.

5 . A photolithography method according to claim 1 , further comprising the steps of:

detecting the exposing light beam outputted from the exposing light source, and

controlling the driving current of the exposing light source based on the detected light intensity such that the detected light intensity becomes a predetermined value.

6 . A photolithography method according to claim 2 , further comprising the steps of:

detecting the exposing light beam outputted from the exposing light source, and

controlling the driving current of the exposing light source based on the detected light intensity such that the detected light intensity becomes a predetermined value.

7 . A photolithography apparatus, comprising:

an exposing section having a plurality of exposing head arrays arranged in the sub-scanning direction in an indented manner in the main scanning direction, each array having a plurality of exposing heads for irradiating exposing light beams by receiving the exposing light beams outputted from exposing light sources, and

a scanning means for exposing a photosensitive material with the exposing light beams by moving the exposing section in the sub-scanning direction relative to the photosensitive material, wherein

the exposing light sources are constructed to output the exposing light beams to each of the exposing head arrays on an array by array basis when drive controlled, and

the apparatus further comprises an exposing light source control means for controlling the exposing light sources such that the irradiation of the exposing light beams by the exposing head arrays is initiated on an array by array basis in the order in which the exposing head arrays are arranged in the sub-scanning direction for initiating the exposure of the photosensitive material.

8 . A photolithography apparatus, comprising:

an exposing section having a plurality of exposing head arrays arranged in the sub-scanning direction in an indented manner in the main scanning direction, each array having a plurality of exposing heads for irradiating exposing light beams by receiving the exposing light beams outputted from exposing light sources, and

a scanning means for exposing a photosensitive material with the exposing light beams by moving the exposing section in the sub-scanning direction relative to the photosensitive material, wherein

the exposing light sources are constructed to terminate the exposing light beams outputted to each of the exposing head arrays on an array by array basis when drive controlled, and

the apparatus further comprises an exposing light source control means for controlling the exposing light sources such that the irradiation of the exposing light beams by the exposing head arrays is terminated on an array by array basis in the order in which the exposing head arrays are arranged in the sub-scanning direction for terminating the exposure of the photosensitive material.

9 . A photolithography apparatus according to claim 7 , wherein

the exposing light sources are constructed to output the exposing light beams to the respective exposing heads on a head by head basis, and

the exposing light source control means is constructed to drive control the exposing light sources such that the exposing light beams are irradiated only by a range of the exposing heads corresponding to the width of the photosensitive material in the main scanning direction.

10 . A photolithography apparatus according to claim 8 , wherein

the exposing light sources are constructed to output the exposing light beams to the respective exposing heads on a head by head basis, and

the exposing light source control means is constructed to drive control the exposing light sources such that the exposing light beams are irradiated only by a range of the exposing heads corresponding to the width of the photosensitive material in the main scanning direction.

11 . A photolithography apparatus according to claim 7 , further comprising:

an exposing light beam detecting means for detecting the intensity of the exposing light beam outputted from the exposing light source, and

a driving current control means for controlling the driving current of the exposing light source based on the detected light intensity such that the detected light intensity becomes a predetermined value.

12 . A photolithography apparatus according to claim 8 , further comprising:

an exposing light beam detecting means for detecting the intensity of the exposing light beam outputted from the exposing light source, and

a driving current control means for controlling the driving current of the exposing light source based on the detected light intensity such that the detected light intensity becomes a predetermined value.

13 . A photolithography apparatus according to claim 7 , wherein the exposing light source comprises a laser diode.

14 . A photolithography apparatus according to claim 8 , wherein the exposing light source comprises a laser diode.