Solid-state imaging device, method of manufacturing solid-state imaging device and method of driving solid-state imaging device
View Patent ↗A solid-state imaging device capable of securing sufficient sensitivity and obtaining favorable characteristics is provided. The solid-state imaging device includes a charge-transfer portion 2 provided on one side of each column of light-receiving sensor portions 1 , each forming a pixel, arranged in the form of a matrix and a transfer electrode of the charge-transfer portion 2 including a first transfer electrode formed of first electrode layers 3 A and 3 C and a second transfer electrode formed by electrically connecting first electrode layers 3 B and 3 D and a second electrode layer 4 ; the first electrode layers 3 B and 3 D in the second transfer electrode are independently formed in each of the charge-transfer portion 2 ; and the first transfer electrodes 3 A and 3 C and the second electrode layer 4 are laminated in a portion between pixels adjacent to each other in the direction of the charge-transfer portions 2.
1. A solid-state imaging device comprising:
a substrate;
a plurality of pixels arranged in a matrix of rows and columns on the substrate, each pixel configured to convert incident light into electrical charges; and
a plurality of charge-transfer portions, each located on side of a respective column of the pixels so that, expect of a last column, each charge-transfer portion is located between adjacent columns of pixels,
wherein,
each charge-transfer portion includes vertical transfer resistor, a first transfer electrode layer and a second transfer electrode layer stacked on the substrate with the first transfer electrode layer between the second transfer electrode layer and the substrate, and the vertical transfer resistor is located under the first transfer electrode layer,
each first transfer electrode layer includes first, second, third and fourth first transfer electrodes arranged in that order along a column direction,
each second transfer electrode layer includes first and second second transfer electrodes arranged in that order along the column direction,
the first second transfer electrode is located to overlap the second first transfer electrode and the third first transfer electrode, and the second second transfer electrode is located to overlap the fourth first transfer electrode,
the first second transfer electrode is connected to the second first transfer electrode and the second second transfer electrode is connected to the fourth first transfer electrode by means of respective contact layers,
in cross-section along a row direction, each of the second and fourth first transfer electrodes is wider than each of the first and second second transfer electrodes, respectively,
wirings between adjacent rows of pixels, a first wiring connected to all first first transfer electrodes, a second wiring connected to all first second transfer electrodes, a third wiring connected to all third first transfer electrodes and a fourth wiring connected to all second second transfer electrodes, and
each of the first and second second transfer electrodes is located in a vicinity of the respective contact layers.
2. The solid-state imaging device of claim 1 , wherein each of the first and second second transfer electrodes and the wiring to which it is connected are a unity conductive layer.
3. The solid-state imaging device of claim 1 , wherein each of the first and third first transfer electrodes and the wiring to which it is connected are a unitary conductive layer.
4. The solid-state imaging device of claim 1 , wherein the first and second transfer electrode layers are made of polycrystalline silicon.
5. The solid-state imaging device of claim 1 , further comprising a light shielding film that has openings in registry with the pixels.
6. The solid-state imaging device of claim 1 , further comprising first, second, third and fourth driving signals respectively coupled to the first first transfer electrode, the first second transfer electrode, the third first transfer electrode and the second second transfer electrode.