Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
View Patent ↗A method is provided for making a coated article including an anti-etch layer(s) that is resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s). In certain example embodiments, the anti-etch layer(s) is formed using at least one ion beam (possibly in combination with at least one sputtering target). In certain embodiments, a diamond-like carbon (DLC) inclusive layer(s) may be provided over and/or under the anti-etch layer.
1. A method of making a coated article for use in a window, the method comprising:
providing a glass substrate; and
forming an anti-etch layer on the glass substrate that is resistant to attacks by fluoride-based etchant(s) using each of at least one sputtering target and at least one ion source so that ions in an ion beam from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target, wherein the anti-etch layer comprises one or more of: silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide; and
using the glass substrate with at least the anti-etch layer thereon as a window of a car, train, subway car, bus or building;
wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of at least about 30%.
2. The method of claim 1 , wherein when forming the anti-etch layer gas comprising carbon and/or nitrogen flows through the ion source.
3. The method of claim 1 , wherein when forming the anti-etch layer gas comprising carbon and nitrogen flows through the ion source.
4. The method of claim 1 , wherein the sputtering target comprises one or more of zirconium and silicon.
5. The method of claim 1 , wherein the coated article has a visible transmission of at least about 70%.
6. The method of claim 1 , further comprising ion beam depositing diamond-like carbon (DLC) on the glass substrate under and/or over the anti-etch layer.
7. The method of claim 1 , further comprising forming a layer comprising silicon oxide and/or silicon nitride on the glass substrate so that the layer comprising silicon oxide and/or silicon nitride is located between the glass substrate and the anti-etch layer.
8. The method of claim 1 , wherein the coated article comprises multiple anti-etch layers.
9. The method of claim 1 , further comprising ion beam depositing a protective layer comprising diamond-like carbon over and contacting the anti-etch layer.
10. The method of claim 1 , wherein the anti-etch layer comprises hydrogenated silicon carbide nitride.
11. The method of claim 1 , wherein the anti-etch layer comprises zirconium oxycarbide.
12. The method of claim 1 , wherein the anti-etch layer comprises hydrogenated zirconium carbide.
13. The method of claim 1 , wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of greater than at least about 30%.
14. A method of making a window, the method comprising:
providing a glass substrate; and
forming an anti-etch layer on the glass substrate using at least one sputtering target and at least one ion source so that ions from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target, wherein the anti-etch layer comprises one or more of: silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide; and
using the glass substrate with at least the anti-etch layer thereon in a window of a car, train, subway car, bus or building;
wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of at least about 50%.
15. The method of claim 14 , wherein, when forming the anti-etch layer gas comprising carbon and/or nitrogen flows in the ion source.
16. The method of claim 14 , further comprising providing a dielectric layer between the glass substrate and the anti-etch layer, wherein the dielectric layer comprises an oxide of silicon, or an oxide of tin and/or indium.