Negative photosensitive resin composition
View Patent ↗A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C 20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.
1. A negative photosensitive resin composition comprising
an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule,
an ink repellent (B) made of a polymer having
polymerized units (b1) having a C 20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and
polymerized units (b2) having an ethylenic double bond, and
a photopolymerization initiator (C), wherein
the ink repellent (B) has a number average molecular weight that is at least 1,000 and less than 15,000,
the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and
the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition.
2. The negative photosensitive resin composition according to claim 1 , which contains, based on 100 parts by mass of the photosensitive resin (A), from 0.1 to 200 parts by mass of the ink repellent (B) and from 0.1 to 50 parts by mass of the photopolymerization initiator (C).
3. The negative photosensitive resin composition according to claim 1 , wherein the ink repellent (B) has acidic groups.
4. The negative photosensitive resin composition according to claim 1 , which contains, based on 100 parts by mass of the photosensitive resin (A), from 10 to 500 parts by mass of a radical crosslinking agent (D) made of an alkali-insoluble compound having at least two ethylenic double bonds.
5. The negative photosensitive resin composition according to claim 1 , which contains at least one member selected from the group consisting of carbon black, black titanium oxide, a black metal oxide pigment and an organic pigment.
6. The negative photosensitive resin composition according to claim 1 , wherein the ink repellent (B) has a number average molecular weight that is at least 1000 and less than 10,000.
7. A method of making a negative photosensitive resin composition, the method comprising
blending together an alkali-soluble photosensitive resin (A), an ink repellent (B), a photopolymerization initiator (C); and
producing the resin composition of claim 1 .
8. The negative photosensitive resin composition according to claim 1 , wherein the ink repellent (B) has a number average molecular weight that is at least 3,000 and less than 15,000.
9. The negative photosensitive resin composition according to claim 1 , further comprising a silane coupling agent (E).