Method of fabricating semiconductor cleaners
View Patent ↗A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters. In other embodiments, the three-parameter Hansen solubility model includes additional parameters that enable more accurate solubility predictions. In one embodiment, an additional parameter accounts for oxidizing solution components. In an alternative embodiment, an additional parameter accounts for the acidic/basic property of the solution. Still another embodiment accounts for temperature effects.
1. A method of selecting a cleaning solvent comprising:
compiling a database that includes solvents and solubility parameters for a large plurality of perspective solvents;
selecting from the large plurality of perspective solvents, a small plurality of test solvents;
performing dissolution tests on a solute using the small plurality of test solvents, wherein the solute comprises a material in a semiconductor manufacturing process;
calculating the solubility parameters of the cleaning solvent based on the dissolution tests; and
selecting the cleaning solvent from the database of solubility parameters using the calculated solubility parameters of the cleaning solvent.
2. The method of claim 1 , wherein calculating the solubility parameters of the cleaning solvent includes using a Hansen solubility model.
3. The method of claim 2 , wherein the Hansen solubility model includes a parameter describing the acidity of the solvent.
4. The method of claim 2 , wherein the Hansen solubility model includes a parameter describing the redox potential of the solvent.
5. The method of claim 2 , wherein the Hansen solubility model includes a temperature adjustment.
6. The method of claim 1 , wherein selecting a cleaning solvent from the database includes mixing at least two solvents.
7. The method of claim 6 , wherein mixing at least two solvents comprises forming a mixture so that a set of solubility parameters for the mixture approximates a set of solubility parameters for the solute.
8. The method of claim 7 , wherein the set of solubility parameters are used in a Hansen solubility model.
9. The method of claim 1 , wherein the cleaning solvent is a photoresist stripper.
10. The method of claim 1 , wherein the small plurality is less than about 20.
11. The method of claim 1 , wherein the large plurality is greater than about 200.
12. The method of claim 1 , wherein calculating the solubility parameters of the cleaning solvent includes using a surface tension solubility model.
13. The method of claim 12 , wherein the surface tension solubility model comprises:
constructing a free surface energy plot;
calculating a polar free energy and a dispersive free energy of the solute from the surface free energy plot.
14. The method of claim 1 , further comprising using the calculated solubility parameters of the cleaning solvent to decide if a formulation is useful to remove a material.
15. The method of claim 1 , further comprising using the calculated solubility parameters of the cleaning solvent to compare different cleaning formulations.
16. The method of claim 2 , wherein the Hansen solubility model includes a parameter to account for surface tension.
17. The method of claim 2 , wherein the Hansen solubility model includes a parameter to account for viscosity.
18. The method of claim 2 , wherein the Hansen solubility model includes a fluoride activity parameter.
19. The method of claim 2 , wherein the Hansen solubility model includes an etch rate solubility parameter.