IP Library Patent Application 11127563
Patent Application
App. No. 11/127,563

Blend compositions suitable for RF welding applications

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Patent No.
US None
App. No.
11/127,563
Abstract

Disclosed are films obtained from blends of ethylene copolymers with organic acid salt-modified potassium ionomeric copolymers. The films of the present invention can be welded using RF energy.

Claims (11)

1 . A film comprising:

(a) a blend comprising (i) at least one E/X/Y copolymer where E is ethylene, X is a C 3 to C 8 α,β ethylenically unsaturated carboxylic acid, and Y is a softening comonomer selected from alkyl acrylate and alkyl methacrylate wherein the alkyl groups have from one to eight carbon atoms, wherein X is about 2-30 weight % of the E/X/Y copolymer and Y is about 0-40 weight % of the E/X/Y copolymer, wherein the acid component (X) can be present in either the fully neutralized carboxylate salt form or the partially neutralized carboxylate salt form, and

(ii) one or more organic acids or salts thereof; wherein the combined carboxylate salt functionalities of the blend are at least partially neutralized by potassium; and

(b) optionally at least one other polymeric component, wherein the film absorbs radio frequency (RF) energy.

2 . The film of claim 1 wherein component (b) is present in an amount of from about 1 to about 99 wt %.

3 . The film of claim 2 wherein component (b) is present in an amount of from about 50 to about 95 wt %.

4 . The film of claim 3 wherein component (b) is present in an amount of from about 70 to about 93 wt %.

5 . The film of claim 4 wherein component (b) is at least one compound selected from the group consisting of: ionomeric copolymers, including dipolymer ionomers and terpolymer ionomers; thermoplastic resins, including thermoplastic elastomers, such as polyurethanes, poly-ether-esters, poly-amide-ethers, polyether-ureas, block copolymers based on polyether-block-amide; styrene-butadiene-styrene (SBS) block copolymers; styrene (ethylene-butylene)-styrene block copolymers; polyamides (oligomeric and polymeric); polyesters; polyvinyl alcohol; polyolefins including polyethylene, polypropylene, ethylene/propylene copolymers; ethylene copolymers, including ethylene/vinyl acetate, ethylene/(meth)acrylates, ethylene/(meth)acrylic acid, ethylene/epoxy-functionalized monomer, ethylene/CO, ethylene/vinyl alcohol (polyols); functionalized polymers with grafted maleic anhydride functionality and epoxidized polymers; elastomers, such as EPDM, metallocene catalyzed polyetheylene and copolymer, ground up powders of the thermoset elastomers; blends comprising at least one any of these materials; and materials that are not susceptible to RF radiation

2 . A film comprising:

(a) a blend comprising (i) at least one E/X/Y copolymer where E is ethylene, X is a C 3 to C 8 α,β ethylenically unsaturated carboxylic acid, and Y is a softening comonomer selected from alkyl acrylate and alkyl methacrylate wherein the alkyl groups have from one to eight carbon atoms, wherein X is about 2-30 weight % of the E/X/Y copolymer and Y is about 0-40 weight % of the E/X/Y copolymer, wherein the acid component (X) can be present in either the fully neutralized carboxylate salt form or the partially neutralized carboxylate salt form, and

(b) optionally at least one other polymeric component, wherein the film absorbs radio frequency (RF) energy.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2019
From: E.I. DU PONT DE NEMOURS AND COMPANY
To: PERFORMANCE MATERIALS NA, INC.
Reel/Frame 050237/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 12, 2006
From: CHEN, JOHN CHU; WALSH, DAVID J.
To: E. I. DU PONT DE NEMOURS AND COMPANY
Reel/Frame 017608/0666 →