Method of fabricating organic light emitting display

1. A method of fabricating an organic light emitting display, comprising:

forming two first electrodes above a substrate having a top emission region and a bottom emission region, the two first electrodes being formed in the top emission region and the bottom emission region, respectively;

forming a first emission layer in the top emission region and forming a second emission layer in the bottom emission region, the first emission layer and the second emission layer being separated by an insulating layer;

forming a second electrode on the emission layer in the top emission region and bottom emission region; and

selectively forming a reflecting layer pattern on the second electrode in the bottom emission region,

wherein the first electrode of the top emission region is spaced apart from the first electrode of the bottom emission region, and the first electrode of the top emission region is formed of the same material as the first electrode of the bottom emission region.

2. The method of claim 1 , further comprising:

forming at least one thin film transistor between the substrate and the first electrode.

3. The method of claim 1 , wherein the first electrode is a pixel electrode.

4. The method of claim 3 , further comprising:

forming a reflecting layer pattern below the pixel electrode in the top emission region.

5. The method of claim 1 , wherein the second electrode is an opposite electrode.

6. The method of claim 1 , wherein the second electrode comprises a transparent metal layer.

7. The method of claim 6 , further comprising:

forming the second electrode from one of an Mg—Ag layer, a Ca—Ag layer, or a Ba—Ag layer.

8. The method of claim 1 , further comprising:

forming the second electrode from one of an Mg—Ag layer, a Ca—Ag layer, or a Ba—Ag layer.

9. The method of claim 1 , wherein the second electrode is approximately 10 to 100 Å thick.

10. The method of claim 1 , wherein the reflecting layer pattern comprises an aluminum layer, a silver layer, a gold layer, a palladium layer, or an alloy thereof.

11. The method of claim 1 , wherein the reflecting layer pattern is approximately 100 to 3000 Å thick.

12. The method of claim 1 , wherein the reflecting layer pattern is approximately 500 to 2500 Å thick.

13. The method of claim 1 , further comprising:

forming the reflecting layer pattern using a thermal deposition technique.

14. The method of claim 1 , further comprising:

forming the reflecting layer pattern using a sputtering technique.

15. The method of claim 1 , further comprising:

using a mask that exposes the second region to selectively form the reflecting layer pattern on the second electrode in the bottom emission region.

16. A method of forming an organic light emitting display substrate having a top emission region and a bottom emission region, comprising:

forming a pixel electrode in the top emission region and the bottom emission region;

forming a first emission layer in the top emission region and forming a second emission layer in the bottom emission region, the first emission layer and the second emission layer being separated by an insulating layer;

forming an opposite electrode on an entire surface of the substrate; and

selectively forming a reflecting layer on the opposite electrode formed in the bottom emission region;

wherein the pixel electrode of the top emission region is spaced apart from the pixel electrode of the bottom emission region, and the pixel electrode of the top emission region is simultaneously formed with the pixel electrode of the bottom emission region.

17. The method of claim 16 , wherein the reflecting layer is approximately 500 to 2500 Å thick.

18. The method of claim 17 , wherein the opposite electrode of the organic light emitting display substrate is simultaneously formed on the top emission region and the bottom emission region.