Centralized control architecture for a laser materials processing system
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.
1 . A method of controlling a laser beam system, the method comprising the steps of:
a) directing an incident laser beam onto a workpiece;
b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device wherein at least one auxiliary device is one of an energy source and an automatic process controller; and
c) detecting said output parameter generated by at least one auxiliary device and adjusting said at least one command signal provided to at least one auxiliary device based on said detected output.
2 - 47 . (canceled)