Apparatus for depositing droplets
View Patent ↗An apparatus for depositing droplets on a substrate is disclosed. The apparatus includes a support for the substrate, a droplet ejection assembly which includes a pumping chamber, a controller and a source of static pressure to maintain the total pressure in the pumping chamber above a threshold pressure level to avoid rectified diffusion type bubble growth in the pumping chamber. The droplet ejection assembly is positioned over the support for depositing the droplets on the substrate and includes, in addition to a pumping chamber, a displacement member and an orifice that ejects the droplets. The controller provides signals to the displacement member to eject drops.
1. A method for use with an apparatus for depositing droplets on a substrate including a pumping chamber having an initial static pressure in the chamber and a displacement device to eject drops of a fluid from the chamber, comprising:
raising the static pressure in the pumping chamber above a threshold pressure level; and
actuating the displacement device to eject drops from the chamber while the static pressure in the chamber is raised above the threshold pressure level to reduce growth of rectified diffusion type bubbles in the pumping chamber.
2. The method of claim 1 , wherein the static pressure is greater than about 1.5 atmospheres absolute.
3. The method of claim 1 , wherein the source of static pressure comprises a pressurized gas.
4. The method of claim 3 , further comprising filtering the pressurized gas to remove particulate matter.
5. The method of claim 3 , further comprising adding moisture to the pressurized gas.
6. The method of claim 3 , further comprising adding solvent to the pressurized gas.
7. The method of claim 3 , wherein the gas comprises air.
8. The method of claim 3 , wherein the gas has an oxygen content less than that of air.
9. The method of claim 1 , wherein the droplets comprise ink.