Thin film transistor and flat panel display using the same
View Patent ↗A thin film transistor, and a flat panel display with the same, including a gate electrode, source and drain electrodes, an organic semiconductor layer, and a gate insulating layer. A first capacitance is a capacitance at a first point where the organic semiconductor layer, an electrode, and the gate insulating layer contact one another, a second capacitance is a capacitance at a second point where the organic semiconductor layer contacts the gate insulating layer, a third capacitance is a capacitance at a third point where the electrode contacts the gate insulating layer, and a fourth capacitance is a capacitance at a fourth point where the organic semiconductor layer contacts the electrode. The first capacitance is greater than one of the second capacitance, the third capacitance, and the fourth capacitance.
1. A thin film transistor, comprising:
a gate electrode;
a source electrode and a drain electrode;
an organic semiconductor layer insulated from the gate electrode and contacting the source electrode and the drain electrode; and
a gate insulating layer insulating the source electrode and the drain electrode from the gate electrode,
wherein:
a first capacitance is a capacitance at a first point per unit area where the organic semiconductor layer, one of the source electrode and the drain electrode, and the gate insulating layer contact one another,
a second capacitance is a capacitance at a second point per unit area where the organic semiconductor layer contacts the gate insulating layer,
a third capacitance is a capacitance at a third point per unit area where the one of the source electrode and the drain electrode contacts the gate insulating layer,
a fourth capacitance is a capacitance at a fourth point per unit area where the organic semiconductor layer contacts the one of the source electrode and the drain electrode,
the first capacitance is greater than one of the second capacitance, the third capacitance, and the fourth capacitance, and
wherein a first dielectric constant of a first portion of the gate insulating layer below the first point is greater than one of a second dielectric constant of a second portion of the gate insulating layer below the second point and a third dielectric constant of a third portion of the gate insulating layer below the third point.
2. The thin film transistor of claim 1 , wherein a first dielectric constant of a first portion of the gate insulating layer below the first point is greater than both a second dielectric constant of a second portion of the gate insulating layer below the second point and a third dielectric constant of a third portion of the gate insulating layer below the third point.
3. The thin film transistor of claim 1 , wherein the first portion of the gate insulating layer comprises at least one of a silicon oxide and a silicon nitride,
wherein the silicon oxide and the silicon nitride further include at least a compound selected from TiO 2 , MgO, ZnO, Al 2 O 3 , SnO 2 , In 2 O 3 , MgF 2 , and CaF 2 .
4. The thin film transistor of claim 3 , wherein a part of the second portion of the gate insulating layer comprises at least one of a silicon oxide and a silicon nitride.
5. The thin film transistor of claim 3 , wherein a part of the third portion of the gate insulating layer comprises at least one of a silicon oxide and a silicon nitride.