Solid-state image sensor with photoelectric conversion units each having a first conductive-type impurity region boundary non-coplanar with second conductive-type impurity region boundaries
View Patent ↗A first p + -type region on a surface of a photodiode unit is formed over a region from a surface of the photodiode unit through a surface of a signal charge read-out unit until reaching the charge transfer unit. Also, the following structure is adapted: the structure in which a boundary between the first p + -type region and a p ++ -type region is not on a same plane with a boundary of an n-type impurity region which forms the photodiode unit on a side of the signal charge read-out unit. Further, a second p + -type region is formed between the first p + -type region and the p ++ -type region on the surface of the photodiode unit. The second p + -type region has an impurity concentration between the impurity concentrations of the first p + -type region and the p ++ -type region.
1. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit, and
wherein one of the first conductive-type impurity regions is formed over a region from a portion of a surface of said photoelectric conversion unit through a surface of said charge read-out unit until reaching said charge transfer unit.
2. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit, and
wherein one of the first conductive-type impurity regions is formed so as to be horizontally surrounded with other first conductive-type impurity regions on the surface of the semiconductor substrate, and has a higher impurity concentration and a deeper impurity diffusion depth than the other first conductive-type impurity regions.
3. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit,
wherein a first region is formed so as to be horizontally surrounded with a second region on the surface of the semiconductor substrate, the first region having a higher impurity concentration than and a same impurity diffusion depth with the second region, and each of the first and second regions being one of the first conductive-type impurity regions, and
wherein a third region is formed so as to be horizontally surrounded with the first region on the surface of the semiconductor substrate, the third region having a higher impurity concentration and a deeper impurity diffusion depth than the first region, and the third region being one of the first conductive-type impurity regions.
4. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit, and
wherein a boundary of one of the first conductive-type impurity regions on the other side of said charge read-out unit is formed offset towards an inner side of a boundary of the second conductive-type impurity region on the other side of said charge read-out unit, said one of the first conductive-type impurity regions having a highest impurity concentration among the first conductive-type impurity regions.
5. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit, and
wherein an impurity concentration of the first conductive-type impurity region having a highest impurity concentration is fifteen times higher than the adjacent first conductive-type impurity region.
6. A solid-state image sensor comprising:
photoelectric conversion units operable to photoelectrically convert incident light into signal charge, and to store the signal charge, said photoelectric conversion units being arranged two-dimensionally on a semiconductor substrate;
a charge transfer unit operable to transfer the signal charge read from said photoelectric conversion unit; and
a charge read-out unit operable to read out the signal charge stored in said photoelectric conversion unit to said charge transfer unit, said charge read-out unit being formed between said photoelectric conversion unit and said charge transfer unit;
wherein each of said photoelectric conversion units includes
first conductive-type impurity regions formed on a surface of said semiconductor substrate and having boundaries on the side of said charge read-out unit, and
a second conductive-type impurity region formed under the first conductive-type impurity regions,
wherein a boundary of the second conductive-type impurity region on a side of said charge read-out unit is not on a same plane with any of the boundaries of the first conductive-type impurity regions on the side of said charge read-out unit, and
wherein an impurity concentration of one of the first conductive-type impurity regions other than a region having a highest impurity concentration is same as an impurity concentration of the second conductive-type impurity region which forms said photoelectric conversion unit.