Depilatory compositions

1 . A dual phase depilatory composition, comprising:

a first acidic phase, containing a thiol-based depilatory agent; and

a separate alkaline phase, wherein said first acidic phase and said separate alkaline phase are kept apart until use.

2 . The dual phase depilatory composition of claim 1 , wherein said first acidic phase and said separate alkaline phase composition when combined has a pH of 12 or less.

3 . The dual phase depilatory composition of claim 1 , wherein said thiol-based depilatory agent is selected from the group consisting of one or more thiol acids selected from thioglycolic, thiolactic acid, 13-mercaptopropionic acid, the alkali and/or the alkaline-earth metal salts of these acids, β-mercaptoethanol, thioglycerols, 1,3-dithio-2-propanol, 1,4-dithio-2-butanol, 1,4-dimercapto-2,3-butanediol, 1,3-dithio-2-methoxypropane, 1,3-dimercapto-2-aminopropane, 1,4-dimercapto-2,3-diaminobutane, and aminoethanethiol.

4 . The dual phase depilatory composition of claim 1 , wherein said first acidic phase further comprises an additive, which decomposes at a pH of above 8.0.

5 . The dual phase depilatory composition of claim 4 , wherein said first acidic phase further comprises a fragrance.

6 . The dual phase depilatory composition of claim 5 , wherein said first acidic phase further comprises a fragrance selected from the group consisting of aldehydes, ketones, and esters.

7 . The dual phase depilatory composition of claim 4 , wherein said first acidic phase further comprises one or more moisturizers, anti-oxidants, tanners, or anti-aging ingredients.

8 . The dual phase depilatory composition of claim 1 , wherein said separate alkaline phase comprises a pH buffer selected from the group consisting of calcium hydroxide and sodium hydroxide.

9 . The dual phase depilatory composition of claim 1 , wherein said thiol-based depilatory agent is potassium thioglycolate, 3-mercapto-1,2-propanediol, and 2-aminoethanethiol.

10 . The dual phase depilatory composition of claim 1 , wherein said composition comprises a heated depilatory upon mixing of said first acidic phase and said separate alkaline phase.

11 . A single phase depilatory composition, comprising:

a thiol-based depilatory agent, wherein said thiol-based depilatory agent consists essentially of 2-aminoethanethiol, said composition further containing an emulsifying agent, and a thickener;

a pH buffer, to provide pH of at least 11.0; and

wherein said composition is devoid of biguanide or aminoguanidine sulfate.

12 . The single phase depilatory composition of claim 11 , wherein said pH buffer is selected from the group consisting of calcium hydroxide and sodium hydroxide.

13 . The single phase depilatory agent of claim 11 , wherein said composition is packaged in a bag-on-valve aluminum can packaging system to maintain an environment favorable to product stability.

14 . A single phase depilatory composition, comprising:

3% to 10% by weight 2-aminoethanethiol; and

a pH buffer, to provide said composition with a pH of less than 12.7, wherein said pH buffer comprises less than 6.5% by weight of the composition.

15 . The single phase depilatory composition of claim 14 , wherein said pH buffer provides said composition with a pH of less than 12.0.

16 . The single phase depilatory composition of claim 14 , wherein said composition comprises 4% to 7.5% by weight said 2-aminoethanethiol and 4% to 6% by weight said pH buffer.

17 . The single phase depilatory composition of claim 14 , wherein said pH buffer is selected from the group consisting of calcium hydroxide, sodium hydroxide, and the combination thereof.

18 . The single phase depilatory agent of claim 14 , wherein said composition is packaged in a bag-on-valve aluminum can packaging system to maintain an environment favorable to product stability.

19 . A single phase depilatory composition, comprising:

2-aminoethanethiol; and

a pH buffer, to provide said composition with a pH of less than 12.7; and

wherein said composition provides for the complete removal of hair in 3 minutes or less.

20 . The single phase depilatory of claim 19 , wherein said composition comprises 3% to 10% by weight 2-aminoethanethiol.

21 . The single phase depilatory composition of claim 19 , wherein said pH buffer is selected from the group consisting of calcium hydroxide, sodium hydroxide, and the combination thereof.

22 . The single phase depilatory agent of claim 19 , wherein said composition is packaged in a bag-on-valve aluminum can packaging system to maintain an environment favorable to product stability.

23 . A method of hair removal, comprising the steps of:

contacting an area of skin from which to remove hair with a depilatory composition comprising:

2-aminoethanethiol; and

a pH buffer, to provide said composition with a pH of less than 12.7; and

removing said depilatory composition from contact with skin in 3 minutes or less, wherein said method results in complete removal of hair.

24 . The method of hair removal of claim 23 , wherein said composition comprises 3% to 10% by weight 2-aminoethanethiol.

25 . The method of hair removal from claim 23 , wherein said pH buffer is selected from the group consisting of calcium hydroxide, sodium hydroxide, and and the combination thereof.

26 . The single phase depilatory agent of claim 23 , wherein said composition is packaged in a bag-on-valve aluminum can packaging system to maintain an environment favorable to product stability.

27 . A method of hair removal, comprising the steps of:

contacting an area of skin from which to remove hair with a dual phase depilatory composition comprising;

a first acidic phase, containing a thiol-based depilatory agent; and

a separate alkaline phase, containing a pH buffer to, provide a pH of at least 11.0, when said first acidic phase and said separate alkaline phase are mixed;

mixing said first and said second phases, and applying said mixture to skin; and

removing said depilatory composition from contact with the skin after a predetermined period of time.

28 . The method of hair removal from claim 27 , wherein said thiol-based depilatory agent is selected from the group consisting of one or more thiol acids selected from thioglycolic, thiolactic acid, β-mercaptopropionic acid, the alkali and/or the alkaline-earth metal salts of these acids, β-mercaptoethanol, thioglycerols, 1,3-dithio-2-propanol, 1,4-dithio-2-butanol, 1,4-dimercapto-2,3-butanediol, 1,3-dithio-2-methoxypropane, 1,3-dimercapto-2-aminopropane, 1,4-dimercapto-2,3-diaminobutane, aminoethanethiol, and related effective thiol actives.

29 . The method of hair removal from claim 27 , wherein said pH buffer is selected from the group consisting of calcium hydroxide, sodium hydroxide, and and the combination thereof.

30 . The method of claim 27 , wherein said first acidic phase further comprises an additive, which decomposes at a pH of above 8.0.

31 . The method of claim 30 , wherein said first acidic phase further comprises a fragrance.

32 . The method of claim 31 , wherein said first acidic phase further comprises a fragrance selected from the group consisting of aldehydes, ketones, and esters.