IP Library Granted Patent US 7,534,904
Granted Patent B2
US 7,534,904 · App. 11/138,352 · Granted May 19, 2009

Silicon-containing compound, composition containing said compound, and insulating material

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,534,904
App. No.
11/138,352
Granted
May 19, 2009
Kind
B2
Abstract

A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): A n SiX (4-n)   (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.

Claims (17)

1. An insulating material formed by using a composition comprising:

(a) a compound represented by formula (3):

wherein (m31+m32+m33+m34) represents an integer of from 1 to 4;

n31 to n34 each independently represents an integer of from 1 to 3;

X 31 to X 34 each independently represents a hydrolyzable group;

R 31 to R 34 each independently represents an alkyl group, an aryl group or a heterocyclic group;

L 31 to L 34 each independently represents an alkylene, a vinylene, an arylene, —O—, —S—, —CO—, —NR′— or a divalent group including a combination thereof; and

R′ represents a hydrogen atom, an alkyl group or an aryl group;

(b) at least one of a hydrolysate of the compound represented by formula (3) and a condensate of the compound represented by formula (3); and

(c) at least one of an organic solvent and water.

2. An insulating film formed by using a composition according to claim 1 .

3. The insulating material according to claim 1 ,

wherein the hydrolyzable group represented by X 31 to X 34 is selected from the group consisting of a halogen atom, an alkoxy group, an aryloxy group, an acyloxy group, a silyloxy group and a hydroxyl group.

4. The insulating material according to claim 3 ,

wherein the hydrolyzable group represented by X 31 to X 34 is a substituted or unsubstituted alkoxy group.

5. The insulating material according to claim 1 ,

wherein R 31 to R 34 each independently represents a linear, branched or cyclic alkyl group, a substituted or unsubstituted phenyl group or naphthyl group, a substituted or unsubstituted hetero 6-membered ring or a substituted or unsubstituted hetero 5-membered ring.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →