Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices
View Patent ↗Nanostructure manufacturing methods and methods for assembling nanostructures into functional elements such as junctions, arrays and devices are provided. Systems for practicing the methods are also provided.
1. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the first material is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.
2. The method of claim 1 , wherein the nanostructure comprises a heterostructure nanostructure.
3. The method of claim 1 , wherein the nanostructure comprises a nanowire, nanotube, nanorod, or nanoribbon.
4. The method of claim 1 , wherein the first region comprises a sheath.
5. The method of claim 1 , wherein the first material comprises silicon oxide.
6. The method of claim 1 , wherein the method comprises etching a set of etchable portions, thereby releasing a set of nanostructures.
7. The method of claim 1 , wherein the first material of the nanostructure is etched with one or more etchant.
8. The method of claim 7 , wherein the etchant comprises one or more of: a dry etchant, a wet-etchant, an isotropic etchant, an anisotropic etchant and a selective etchant.
9. The method of claim 1 , wherein the nanostructure is attached to the substrate at the first region of the nanostructure.
10. The method of claim 1 , wherein the first region and second region are adjacent to one another along the length of the nanostructure.
11. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the first material comprises a dopant that is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.
12. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the first region and second region are not adjacent to one another along the length of the nanostructure and the first material is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.
13. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the first material comprises silicon and the second material comprises germanium and the first material is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.
14. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the second region comprises a P-N junction and the first material is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.
15. A method of harvesting a nanostructure from a substrate, the nanostructure comprising at least a first region comprising a first material and a second region comprising a second material, wherein the nanostructure is attached to the substrate at a first end of the nanostructure and the first region of the nanostructure is located along the length of the nanostructure at a location which is not immediately adjacent to the first end of the nanostructure and the first material is differentially etchable from the second material, the method comprising etching away the first material of the nanostructure to release the nanostructure from the substrate at the first region.