Active region of a light emitting device optimized for increased modulation speed operation
In accordance with the invention, increased maximum modulation speeds and improved hole distribution are obtained for light emitting devices. Barrier layers of a quantum well structure for a light emitting device are formed with varying barrier energy heights. Quantum well layers of the quantum well structure are formed between the barrier layers.
1. A method comprising:
forming barrier layers of a quantum well structure for a light emitting device, said barrier layers having successively decreasing barrier energy heights, and said barrier energy heights decreasing non-linearly; and
forming quantum well layers of said quantum well structure between said barrier layers.
2. The method of claim 1 , wherein said barrier energy heights comprise successively reduced barrier energy heights along a direction of injection of carriers having a lower mobility.
3. The method of claim 1 , wherein each of said barrier layers comprises aluminum gallium arsenide (AlGaAs) and includes a different fraction of aluminum (Al).
4. The method of claim 1 , wherein a barrier layer of said barrier layers comprises gallium arsenide (GaAs).
5. The method of claim 1 , wherein the forming barrier layers includes forming barrier layers that are arranged by barrier height such that they form a descending gradient of successive barrier energy heights.
6. The method of claim 1 , wherein the forming barrier layers includes forming barrier layers that are arranged by barrier height such that they form a tiered succession of reduced barrier energy heights.
7. A vertical cavity surface emitting laser (VCSEL) comprising:
a quantum well structure comprising:
a plurality of barrier layers having successively non-linearly decreasing barrier energy heights, wherein each of said barrier layers comprises indium gallium arsenide phosphide (InGaAsP); and
a plurality of quantum well layers interleaved with said plurality of barrier layers.
8. The VCSEL of claim 7 , wherein each of said barrier layers has a different fraction of indium (In).
9. The VCSEL of claim 7 , wherein each of said barrier layers has a different fraction of arsenide (As).
10. The VCSEL of claim 7 , wherein said quantum well structure is structured to generate light in the range of approximately 850 nm to approximately 1550 nm.
11. The VCSEL of claim 7 , wherein the plurality of barrier layers are arranged by barrier height such that they form a descending gradient of successive barrier energy heights.
12. The VCSEL of claim 7 , wherein the plurality of barrier layers are arranged by barrier height such that they form a tiered succession of reduced barrier energy heights.
13. A quantum well structure for a light emitting device, the quantum well structure comprising:
a plurality of barrier layers, wherein each of said plurality of barrier layers comprises a different percentage of arsenide (As), and wherein said barrier layers have successively non-linearly decreasing barrier energy heights; and
a plurality of quantum well layers.
14. The quantum well structure of claim 13 , wherein each of said barrier layers comprises gallium arsenide (GaAs).
15. The quantum well structure of claim 13 , wherein said quantum well structure generates light in the range of approximately 850 nm to approximately 1550 nm.
16. The quantum well structure of claim 13 , wherein the plurality of barrier layers are arranged by barrier height such that they form a descending gradient of successive barrier energy heights.
17. The quantum well structure of claim 13 , wherein the plurality of barrier layers are arranged by barrier height such that they form a tiered succession of reduced barrier energy heights.