Adaptable fixation for cylindrical magnetrons

1 . A method of attaching a cylindrical target to an endblock, comprising:

forming a circular groove in an end portion of the target;

positioning a flange ring such that the flange ring encircles the target, the flange ring having an inner diameter that is equal to or greater than the outer diameter of the target;

inserting a retaining ring into the groove, the retaining ring extending about the target; and

subsequently clamping the target to a spindle by placing a clamp ring about the spindle and the flange ring, the flange ring position fixed along the axis of the target by the retaining ring.

2 . The method of claim 1 wherein the clamp ring is tightened to exert force both inwards in a radial direction and inwards along the axis of the target.

3 . The method of claim 1 wherein the end portion of the target includes a threaded portion and the groove is formed between the threaded portion and the end of the target.

4 . The method of claim 1 further comprising similarly attaching the opposite end of the target to another endblock.

5 . A cylindrical magnetron sputtering system, comprising:

a cylindrical target having target material on an outer cylindrical surface and having a groove located in an end portion;

a retaining ring in the groove, the retaining ring having an inner diameter that is less than the diameter of the end portion and an outer diameter that is greater than the diameter of the end portion;

a flange ring that encircles the target, the flange ring having an inner diameter that is greater than the outer diameter of the end portion but is less than the outer diameter of the retaining ring so that the flange ring cannot pass over the retaining ring, the flange ring having an outer circumference;

a spindle having an outer circumference; and

a clamp ring that encircles the outer circumference of the flange ring and the outer circumference of the spindle.

6 . The cylindrical magnetron sputtering system of claim 5 further comprising an o-ring that seals between the spindle and the target.

7 . The cylindrical magnetron sputtering system of claim 5 wherein the target has a threaded portion adjacent to the groove.

8 . A cylindrical target assembly for sputtering of target material in a cylindrical magnetron sputtering system, comprising:

a target having target material on an outer cylindrical surface and having a circular groove located in an end portion;

a retaining ring in the groove, the retaining ring having an inner diameter that is less than the diameter of the end portion and an outer diameter that is greater than the diameter of the end portion; and

a flange ring that encircles the target, the flange ring having an inner diameter that is greater than the outer diameter of the end portion but is less than the outer diameter of the retaining ring so that the flange ring cannot pass over the retaining ring.

9 . A method of modifying a cylindrical magnetron configured for cylindrical targets having threaded ends to operate with cylindrical targets having flanges, comprising:

removing a threaded collar from an endblock, the threaded collar extending around a spindle, the threaded collar having a threaded inner surface;

attaching an adaptor flange to the spindle, the adaptor flange having an outer circumference;

placing a clamp ring about the outer circumference of the adaptor flange and about a flange attached to a first end of a target; and

tightening the clamp ring to exert force both inwards in a radial direction and inwards along the axis of the target.

10 . The method of claim 9 further comprising removing an opposite threaded collar from an opposite endblock, removing an opposite spindle from the opposite endblock, replacing the opposite spindle with an adapted spindle.

11 . The method of claim 9 wherein the adapted spindle is made from the opposite spindle but includes additional material not included in the opposite spindle.