Thin film transistor, method of fabricating the same, and flat panel display having the same

1. A thin film transistor comprising:

a substrate;

a gate electrode provided on the substrate;

a source electrode and a drain electrode provided on the substrate;

a gate insulating layer provided between the gate electrode and the source electrode and the drain electrode; and

an organic semiconductor layer contacting the source electrode and the drain electrode and insulated from the gate electrode,

wherein oxidation portions are provided in contact portions of the source electrode and the drain electrode that directly contact organic semiconductor layer, the oxidation portions being an oxide of a metal comprising the source electrode and the drain electrode, and

wherein the metal is at least one of Al, Mo, and MoW.

2. The thin film transistor of claim 1 , wherein the gate insulating layer comprises at least one layer formed of SiO 2 , SiN x , Al 2 O 3 , Ta 2 O 5 , BST, PZT, poly methylmethacrylate, polystyrene, phenolic polymers, acrylic polymers, imidic polymers such as polyimide, aryl ether polymers, amidic polymers, fluoric polymers, p-xylilen polymers, vinyl alcoholic polymers, s parylene, or any derivative or combination thereof.

3. The thin film transistor of claim 1 , wherein the organic semiconductor layer is formed of at least one of pentacene, tetracene, anthracene, naphthalene, alpha-6-thiophene, and any of the following or their derivatives: perylene, rubrene, coronene, perylene tetracarboxylic diimide, perylene tetracarboxylic dianhydride, polythiophene, polyparaphenylenvinylene, polyparaphenylen, polyflorene, polythiophenevinylene, polythiophene-heterocyclic aromatic copolymer, oligoacene of naphthalene, oligothiophene of alpha-5-thiophene, metal-containing or metal-free phthalocyanin, pyromelitic dianhydride, pyromelitic diimide, perylenetetracarboxylic acid dianhydride, perylenetetracarboxylic diimide, naphthalene tetracarboxylic acid diimide, and naphthalene tetracarboxylic acid dianhydride.

4. The thin film transistor of claim 1 , wherein the oxidation portions are formed of a material having a work function that is greater than a HOMO energy level of the organic semiconductor layer.

5. A flat panel display comprising a thin film transistor layer and a pixel layer having at least one pixel and formed in a display region of a substrate, wherein the thin film transistor layer comprises:

a gate electrode provided on the substrate;

a gate insulating layer provided on the gate electrode;

a source electrode and a drain electrode provided on the gate insulating layer and insulated from the gate electrode; and

an organic semiconductor layer contacting the source electrode and the drain electrode and insulated from the gate electrode,

wherein oxidation portions are provided in contact portions of the source and drain electrodes that directly contact the organic semiconductor layer, the oxidation portions being an oxide of a metal comprising the source electrode and the drain electrode, and

wherein the metal is at least one of Al, Mo, and MoW.

6. The flat panel display of claim 5 , wherein the oxidation portions are formed of a material having a work function that is greater than a HOMO energy level of the organic semiconductor layer.