Photo development apparatus and method for fabricating a color filter substrate using the same

1. A method of fabricating a color filter substrate for a display panel, comprising:

forming a light shielding layer on a substrate;

forming a positive photo-resist including an acrylic group resin and a novolak group resin on the light shielding layer;

exposing portions of the positive photo-resist using a mask;

supplying a first negative development solution;

supplying a second negative development solution by controlling a concentration of the first negative development solution;

forming a positive photo-resist pattern by developing the exposed portions of the positive photo-resist with the second negative development solution; and

forming a black matrix by patterning the light shielding layer using the positive photo-resist pattern.

2. The method according to claim 1 , further comprising:

forming a color negative photo-resist on the substrate and the black matrix;

exposing portions of the color negative photo-resist using a mask; and

forming a color filter by developing the portions of the exposed color negative photo-resist with the first negative development solution.

3. The method according to claim 2 , wherein R, G, and B color filters are formed at corresponding pixel areas by repeating the forming of the color negative photo-resist, exposing of the portions of the color negative photo-resist, and developing of the exposed portions of the color negative photo-resist.

4. The method according to claim 2 , further comprising:

forming an overcoat negative photo-resist on the color filter;

exposing portions of the overcoat negative photo-resist using a mask; and

developing the portions of the overcoat negative photo-resist with the first negative development solution to form an overcoat layer.

5. The method according to claim 4 , further comprising:

forming a spacer negative photo-resist on the overcoat layer;

exposing portions of the spacer negative photo-resist using a mask; and

developing the portions of the spacer negative photo-resist with the first negative development solution to form a column spacer.

6. The method according to claim 1 , wherein the first and second negative development solutions each include a KOH group development solution.

7. The method according to claim 6 , wherein the first negative development solution has a KOH concentration of about 0.4%, and the second development solution has a KOH concentration of about 1%.

8. The method according to claim 1 , wherein an exposure gap of the positive photo-resist is within a range of about 100 to about 200 μm.

9. The method according to claim 1 , wherein an exposure amount of the positive photo-resist is within a range of about 40 to about 70 mJ.

10. The method according to claim 1 , wherein the second negative development solution is supplied to the positive photo-resist by a spray method with a spray angle within a range of about 40° to about 50°.

11. The method according to claim 10 , wherein a shower flow quantity of the second negative development solution is about 13 to about 17 mL.

12. The method according to claim 1 , wherein the second negative development solution is supplied to the positive photo-resist by dipping the positive photo-resist in the second negative development solution.

13. The method according to claim 1 , wherein the ratio of the novolak group resin to the acrylic group resin included in the positive photo-resist is within the range between about 1 to 0.4 and about 1 to 0.6.

14. The method according to claim 1 , wherein the positive photo-resist has a composition of about 12% to about 17% novolak resin, about 5% to about 10% acrylic resin, about 3% to about 5% photo active compound PAC, and about 77% to about 82% solvent.

15. A method of fabricating a plurality of color filter substrates for display panels, comprising:

forming a light shielding layer on a first substrate;

forming a positive photo-resist including an acrylic group resin and a novolak group resin on the light shielding layer;

exposing portions of the positive photo-resist using a mask;

supplying a first negative development solution;

supplying a second negative development solution by controlling a concentration of the first negative development solution;

forming a positive photo-resist pattern by developing the exposed portions of the positive photo-resist with the second negative development solution;

forming a black matrix by patterning the light shielding layer using the positive photo-resist pattern,

forming a black resin layer on a second substrate;

forming a negative photo-resist on the black resin layer;

exposing portions of the negative photo-resist using a mask; and

developing the exposed portions of the negative photo-resist with the first negative development solution to form a black matrix on the second substrate.