Translucent electromagnetic shield film, producing method therefor and emulsifier
A producing method for a translucent electromagnetic shield film comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then executing a development process to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal. The producing method allows to inexpensively mass produce a translucent electromagnetic shield film without a moiré pattern, having a high EMI shield property and a high transparency at the same time.
1 . A producing method for a translucent electromagnetic shield film comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a protective layer in this order on a substrate or a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then developing the exposed material to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal.
2 . The producing method for a translucent electromagnetic shield film according to claim 1 comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a protective layer in this order on a substrate, then developing the exposed material to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal.
3 . The producing method for a translucent electromagnetic shield film according to claim 1 comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then developing the exposed material to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal.
4 . The producing method for a translucent electromagnetic shield film according to claim 1 , wherein the translucent electromagnetic shield film after the physical development and/or the plating process has a surface resistivity of 10 Ω/sq or lower and an aperture rate of 85% or higher.
5 . The producing method for a translucent electromagnetic shield film according to claim 2 , wherein the translucent electromagnetic shield film after the physical development and/or the plating process has a surface resistivity of 10 Ω/sq or lower and an aperture rate of 85% or higher.
6 . The producing method for a translucent electromagnetic shield film according to claim 3 , wherein the translucent electromagnetic shield film after the physical development and/or the plating process has a surface resistivity of 10 Ω/sq or lower and an aperture rate of 85% or higher.
7 . A translucent electromagnetic shield film prepared by the producing method according to claim 1 .
8 . A translucent electromagnetic shield film prepared by the producing method according to claim 2 .
9 . A translucent electromagnetic shield film prepared by the producing method according to claim 3 .
10 . A translucent electromagnetic shield film for a plasma display panel including a translucent electromagnetic shield film obtained by the producing method according to claim 3 .
11 . An optical filter for a plasma display panel including a translucent electromagnetic shield film obtained by the producing method according to claim 3 .
12 . A plasma display panel including the translucent electromagnetic shield film for a plasma display panel according to claim 10 .
13 . A photosensitive silver halide emulsion including at least a silver halide and being capable of forming, by an exposure and a chemical development, a metallic silver portion having a volume resistivity of 1.6-100 μΩcm.
14 . The photosensitive silver halide emulsion according to claim 13 including at least a silver halide and being capable of forming, by an exposure and a chemical development, a metallic silver portion having a volume resistivity of 1.6-50 μΩcm.
15 . The photosensitive silver halide emulsion according to claim 13 including at least a silver halide and being capable of forming, by an exposure and a chemical development, a metallic silver portion having a volume resistivity of 1.6-10 μΩcm.
16 . A conductive silver film forming material prepared by coating and drying the photosensitive silver halide emulsion according to claim 13 .
17 . A silver halide photosensitive material including a silver salt containing layer obtained by coating and drying the photosensitive silver halide emulsion according to claim 13 on a substrate.
18 . A conductive silver material prepared by a pattern exposure and a chemical development of the silver halide photosensitive material according to claim 17 .
19 . An electrode material employing the conductive silver material according to claim 18 .
20 . A wiring material employing the conductive silver material according to claim 18.