IP Library Granted Patent US 7,371,505
Granted Patent B2
US 7,371,505 · App. 11/167,813 · Granted May 13, 2008

Photosensitive composition and method for forming pattern using the same

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Quick Facts
Patent No.
US 7,371,505
App. No.
11/167,813
Granted
May 13, 2008
Kind
B2
Abstract

A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

Claims (146)

1. A positive photosensitive composition comprising (A) a resin increasing the solubility in an alkaline developer by the action of an acid wherein

the resin (A) is a resin having a repeating unit containing a structure of formula (I),

wherein:

X represents an oxygen atom, a sulfur atom or —C(═O)—;

Lc represents a group for forming a lactone;

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid decomposable group;

Ra 3 represents a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group, or a group having an acid decomposable group;

two of Ra 1 to Ra 3 may combine together to form a ring;

n represents an integer of 1 or 2;

n 1 and n 2 each represents an integer of from 0 to 3, with proviso that (n 1 +n 2 ) represents an integer of from 1 to 6; and

n 3 represents an integer of from 0 to 3.

2. A positive photosensitive composition according to claim 1 , wherein (A) is a resin having a repeating unit containing a structure of formula (I′),

wherein:

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid decomposable group; and

Ra 1 and Ra 2 may combine together to form a ring.

3. A positive photosensitive composition according to claim 1 , wherein (A) is a resin having a repeating unit of formula (Ia),

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2 , wherein Rb 2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group; and

X, Lc, Ra 1 , Ra 2 , Ra 3 , n, n 1 , n 2 and n 3 have the same meaning as in claim 1 , respectively.

4. A positive photosensitive composition according to claim 1 , wherein (A) is a resin having a repeating unit of formula (Ia-1) or (Ia″)

wherein:

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyL group, or an acid decomposable group;

Ra 1 and Ra 2 may combine together to form a ring;

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2 , wherein Rb 2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, -—O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group; and

n 4 represents 0 or 1.

5. A positive photosensitive composition comprising: (A) a resin increasing the solubility in an alkaline developer by the action of an acid, wherein (A) is a resin containing a repeating unit of formula (IIa-1)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Ra 3 represents a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group, or a group having an acid decomposable group;

X 2 represents a single bond or —CH 2 -;

X 3 represents a single bond or —CH 2 -;

X 4 represents a single bond, —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

X 5 represents a single bond, —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

the sum of the number of atoms exclusive of a hydrogen atom of X 4 and X 5 is 1 or 2; and

n 3 represents an integer of from 0 to 3.

6. A positive pholosensitive composition according to claim 5 , wherein (A) is a resin having a repeating unit of formula (IIa′) or (IIa″)

wherein:

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group;

n 4 represents 0 or 1; and

Rc and Rb 1 each has the same meaning as in claim 5 , respectively.

7. A positive photosensitive composition comprising: (A) a resin increasing the solubility in an alkaline developer by the action of an acid: wherein (A) is a resin having a repeating unit containing a structure of formula (III)

wherein:

Lc represents a group for forming a lactone;

Ra 3 represents a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group, or a group having an acid decomposable group;

two Ra 3 may combine together to form a ring;

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—; and

n 2 represents an integer of from 0 to 3.

8. A positive photosensitive composition according to claim 7 , wherein (A) is a resin having a repeating unit containing a structure of formula (III′)

wherein X 1 has the same meaning recited in claim 7 , respectively.

9. A positive photosensitive composition according to claim 7 , wherein (A) is a resin having a repeating unit of formula (IIIa)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group; and

X 1 , Lc, Ra 3 , and n 3 each has the same meaning as recited in claim 7 , respectively.

10. A positive photosensitive composition according to claim 7 , wherein (A) is a resin having a repeating unit of formula (IIIa-1)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Ra 3 represents a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group, or a group having an acid decomposable group;

two Ra 3 groups may combine together to form a ring;

X 2 represents a single bond or —CH 2 —;

X 3 represents a single bond or —CH 2 —;

X 4 represents a single bond, —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

X 5 represents a single bond, —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

the sum of the number of atoms exclusive of a hydrogen atom of X 4 and X 5 is 1 or 2, and

n 3 represents an integer of from 0 to 3.

11. A positive photosensitive composition according to claim 7 , wherein (A) is a resin having a repeating unit of formula (IIIa′) or (IIIa″)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group;

n 4 represents 0 or 1; and

X 1 has the same meaning as in claim 7 , respectively.

12. A resin having a repeating unit containing a structure of formula (I′)

wherein:

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid decomposable group; and

Ra 1 and Ra 2 may combine together to form a ring.

13. A resin according to claim 12 , wherein the resin has a repeating unit of formula (Ia′) or (Ia″)

wherein:

Rb1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyll group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid decomposable group;

Ra 1 and Ra 2 may combine together to form a ring;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, —S—;

Rb 2 , Rb 3 and Rb 4 each independently represent a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group; and

n 4 , represents 0 or 1.

14. A resin having a repeating unit of formula (IIa′) or (IIa″)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 , —O—, —S—, or —CH 2 —S—;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group; and

n 4 represents 0 or 1.

15. A resin having a repeating unit containing a structure of formula (III′)

wherein:

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—.

16. A resin according to claim 15 , wherein the resin has a repeating unit of the formula (IIIa′) or (IIa″)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —S—;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group; and

n 4 represents 0 or 1.

17. A polymerizable compound containing a structure of formula (I′)

wherein:

Ra 1 and Ra 2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid decomposable group; and

Ra 1 and Ra 2 may combine together to form a ring.

18. A polymerizable compound according to claim 17 , containing a structure of formula (Ib′) or (Ib″)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group;

n 4 represents 0 or 1; and

Ra 1 and Ra 2 each have the same meaning as recited in claim 17 , respectively.

19. A polymerizable compound containing a structure of formula (IIb′-1) or (IIb″-1)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group; and

n 4 represents 0 or 1.

20. A polymerizable compound containing a structure of formula (III′)

wherein:

X 1 represents —CH 2 —, —CH 2 CH 2 —, —CH 2 O—, —O—, —S—, or —CH 2 S—.

21. A polymerizable compound according to claim 20 , containing a structure of formula (IIIb′-1) or (IIIb″-1)

wherein:

Rb 1 represents a hydrogen atom, an alkyl group, or —CH 2 —O—Rb 2a , wherein Rb 2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure;

Rc represents a single bond or a divalent connecting group;

Y 2 and Y 3 each independently represents —CH 2 —, —CH 2 CH 2 —, —O—, or —S—;

Rb 2 , Rb 3 , and Rb 4 each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group;

n 4 represents 0 or 1; and

X 1 has the same meaning as in claim 20 , respectively.

22. A method for forming a pattern, which comprises: forming a film from the photosensitive composition according to claim 1 ; exposing the film; and then developing the exposed film.

23. A method for forming a pattern, which comprise: forming a film from the photosensitive composition according to claim 5 ; exposing the film; and then developing the exposed film.

24. A method for forming a pattern, which comprise: forming a film from the photosensitive composition according to claim 7 ; exposing the film; and then developing the exposed film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →