Exposure mask pattern for LCD and exposure method using the same

1. An exposure method for a liquid crystal display (LCD) device, the method comprising:

dividing a sub-pixel region of an array substrate into a plurality of first exposure regions and a plurality of second exposure regions, the first exposure regions and the second exposure regions alternately and in parallel arranged each other within the sub-pixel region and the sub-pixel region being one of a red sub-pixel region, a green sub-pixel region and a blue sub-pixel region;

simultaneously exposing the first exposure regions of the sub-pixel region using a first exposure process; and

simultaneously exposing the second exposure regions of the sub-pixel region using a second exposure process,

wherein the sub-pixel region includes a plurality of LEGO patterns corresponding to regions experiencing overlapped exposures that are overlap of a first exposure exposing the first exposure regions and a second exposure exposing the second exposure regions, the LEGO patterns being formed between the first exposure regions and the second exposure regions respectively, and

wherein the first exposure process and the second exposure process completes exposure of the sub-pixel region for forming one of a pixel electrode, a common electrode, a gate line and a data line.

2. The exposure method according to claim 1 , wherein widths of mask patterns corresponding to regions experiencing the overlapping exposures are respectively formed to be wider than that of mask patterns corresponding to the first and second exposure regions such that one of a pixel electrode, a common electrode, a gate line and a data line is formed using the mask pattern.

3. The exposure method according to claim 1 , wherein exposure deviations at the first exposure regions are respectively compensated by exposure deviations at the second exposure regions to reduce a total exposure deviation of the sub-pixel region.

4. The exposure method according to claim 1 , wherein the LCD is an in-plane switching (IPS) mode LCD in which a pixel electrode and a common electrode are formed on a lower substrate.

5. An exposure method for a liquid crystal display (LCD) device, the method comprising:

dividing a plurality of pixel regions of an array substrate into a plurality of first exposure regions and a second exposure region, the first exposure regions randomly arranged within the second exposure region, and the pixel region including a red sub-pixel region, a green sub-pixel region and a blue sub-pixel region;

simultaneously exposing the first exposure regions using a first exposure process; and

exposing the second exposure region using a second exposure process,

wherein the first exposure region includes the red sub-pixel region, the green sub-pixel region and the blue sub-pixel region of the pixel region, and the second exposure region includes a region except the first exposure regions, and

wherein a LEGO pattern is formed between the first exposure region and the second exposure region and corresponds to a region experiencing an overlapped exposure that is overlap of a first exposure exposing the first exposure region and a second exposure exposing the second exposure region.

6. The exposure method according to claim 5 , wherein the second exposure region is partitioned as a blank region.

7. The exposure method according to claim 5 , wherein the second exposure region is not exposed when the first exposure region is exposed.

8. The exposure method according to claim 5 , wherein the first exposure region is partitioned as a blank region.

9. The exposure method according to claim 5 , wherein the first exposure region is not exposed when the second exposure region is exposed.

10. The exposure method according to claim 5 , wherein an exposure deviation at the first exposure region is compensated by an exposure deviation at the second exposure region, thereby preventing a spot failure.

11. The exposure method according to claim 5 , wherein the LCD is an in-plane switching (IPS) mode LCD in which a pixel electrode and a common electrode are formed on a lower substrate.

12. The exposure method according to claim 5 , wherein a width of mask pattern corresponding to a region experiencing the overlapping exposure is formed to be wider than that of a mask pattern corresponding to the first and second exposure regions such that one of a pixel electrode, a common electrode, a gate line and a data line is formed using the mask pattern.