Coated article with transparent conductive oxide film doped to adjust Fermi level, and method of making same
View Patent ↗A transparent conductive oxide (TCO) based film is formed on a substrate. The film may be formed by sputter-depositing, so as to include both a primary dopant (e.g., Al) and a co-dopant (e.g., Ag). The benefit of using the co-dopant in depositing the TCO inclusive film may be two-fold: (a) it may prevent or reduce self-compensation of the primary dopant by a more proper positioning of the Fermi level, and/or (b) it may promote declustering of the primary dopant, thereby freeing up space in the metal sublattice and permitting more primary dopant to create electrically active centers so as to improve conductivity of the film. Accordingly, the use of the co-dopant permits the primary dopant to be more effective in enhancing conductivity of the TCO inclusive film, without significantly sacrificing visible transmission characteristics. An example TCO in certain embodiments is ZnAlO x :Ag.
1. A method of making a coated article including a transparent conductive film, the method comprising:
providing a glass substrate;
sputtering at least one target comprising each of zinc, aluminum and silver in an atmosphere comprising oxygen so as to form a transparent conductive film on the glass substrate; and
wherein with respect to atomic %, material content in the target comprising zinc, aluminum and silver is characterized by Zn>Al>Ag, so that the target includes more zinc than aluminum, and more aluminum than silver.
2. The method of claim 1 , wherein aluminum is a primary charge carrier dopant in the transparent conductive film, and silver is a co-dopant in the film.
3. The method of claim 1 , wherein said sputtering is performed at approximately room temperature.
4. The method of claim 1 , wherein said sputtering is performed at a temperature of less than 150 degrees C.
5. The method of claim 1 , wherein another layer is provided on the glass substrate so as to be located between the glass substrate and the transparent conductive film.
6. The method of claim 1 , wherein the transparent conductive film comprises ZnAlO x :Ag.
7. The method of claim 1 , wherein the transparent conductive film consists essentially of ZnAlO x :Ag.
8. The method of claim 1 , wherein the coated article has a visible transmission of at least about 50%.
9. The method of claim 1 , wherein the coated article is thermally tempered after the transparent conductive film is provided on the glass substrate.
10. A method of making a coated article including a transparent conductive film, the method comprising:
providing a glass substrate;
sputtering at least one target comprising each of zinc, aluminum and silver in an atmosphere comprising oxygen so as to form a transparent conductive film on the glass substrate; and
wherein the target comprises at least about 50% zinc, from about 0.5 to 7% aluminum, and from about 0.001 to 3% silver.
11. The method of claim 10 , wherein aluminum is a primary charge carrier dopant in the transparent conductive film, and silver is a co-dopant in the film.
12. The method of claim 10 , wherein said sputtering is performed at approximately room temperature.
13. The method of claim 10 , wherein another layer is provided on the glass substrate so as to be located between the glass substrate and the transparent conductive film.
14. The method of claim 10 , wherein the transparent conductive film consists essentially of ZnAlO x :Ag.
15. The method of claim 10 , wherein the coated article has a visible transmission of at least about 50%.
16. A method of making a coated article including a transparent conductive film, the method comprising:
providing a glass substrate;
sputtering at least one target comprising each of zinc, aluminum and silver in an atmosphere comprising oxygen so as to form a transparent conductive film on the glass substrate; and
wherein the target is a ceramic target, and includes from about 0.5 to 7% aluminum, and from about 0.001 to 3% silver.
17. The method of claim 16 , wherein said sputtering is performed at approximately room temperature.
18. The method of claim 16 , wherein the transparent conductive film consists essentially of ZnAlO x :Ag.
19. A method of making a coated article including a transparent conductive film, the method comprising:
providing a substrate;
sputtering at least one target comprising each of zinc, a primary metal dopant, and a co-dopant of a Group IB, IA or V element, wherein the sputtering is performed in an atmosphere comprising oxygen so as to form a transparent conductive film comprising zinc, oxygen, the primary metal dopant and the co-dopant on the substrate and
wherein the target comprises: at least about 50% zinc, from about 0.5 to 7% of a primary dopant comprising Al and/or Mn, and from about 0.001 to 3% of the co-dopant of the Group IB, IA or V element.
20. The method of claim 19 , wherein the primary dopant comprises.
21. The method of claim 19 , wherein the co-dopant comprises Ag.