Method of forming wiring pattern

1. A method of forming a wiring pattern on an insulating substrate using a nanoparticles-containing ink, comprising:

partitioning the insulating substrate into wiring regions using a photoresist film; and

drawing the wiring pattern on the insulating substrate by injecting the ink thereon, the ink comprising metallic nanoparticles,

wherein patterns of the photoresist film which partition the insulating substrate into the wiring regions comprise a reverse tapered cross section, and

wherein said drawing of said wiring pattern comprises leveling the ink formed on the wiring regions.

2. The method according to claim 1 , wherein the metallic nanoparticles are injected on the wiring regions by an inkjet system.

3. The method according to claim 1 , wherein the photoresist film comprises a negative photoresist.

4. The method according to claim 1 , wherein said drawing of said wiring pattern further comprises:

injecting a jet of the ink on the wiring regions;

drying the ink which has been leveled;

separating the photoresist film from the substrate; and

baking the ink on the wiring region.

5. The method according to claim 4 , wherein the ink is injected onto a surface of the insulating substrate before the photoresist film is removed.

6. The method according to claim 1 , wherein the leveling comprises maintaining the insulating substrate at rest in a horizontal position over a predetermined time.

7. The method according to claim 4 , wherein the drying comprises removing a solvent from the ink.

8. The method according to claim 4 , wherein separating the photoresist film from the substrate comprises applying organic solvents to the photoresist film.

9. The method according to claim 4 , wherein baking comprises beating the ink at a temperature in a range from about 150° C. to 350° C.

10. The method according to claim 4 , wherein said injecting comprises drawing the wiring pattern on a surface of the insulating substrate.

11. The method according to claim 1 , wherein the photoresist film comprises a layered film of at least two photoresists with different light sensitivities.

12. The method according to claim 11 , wherein the layered film comprises a positive photoresist, and

wherein a plurality of photoresist films are arranged in an order of increasing sensitivity toward the insulating substrate.

13. The method according to claim 11 , wherein the layered film comprises a negative photoresist, and

wherein a plurality of photoresist films are arranged in an order of decreasing sensitivity toward the insulating substrate.

14. The method according to claim 1 , wherein the metallic nanoparticles comprise an average particle diameter of 1 to 100 μm.

15. The method according to claim 1 , wherein the metallic nanoparticles comprise at least one of Au, Ag, Cu, Pt, Pd, Ni and Al.

16. The method according to claim 1 , wherein the insulating substrate is partitioned into wiring regions by depositing the photoresist film onto a surface of the insulating substrate.

17. The method according to claim 1 , wherein the wiring pattern is drawn on a surface of the insulating substrate.

18. The method according to claim 1 , wherein the photoresist film is deposited at a thickness of 5 μm to 10 μm.

19. The method according to claim 1 , wherein the ink has a viscosity of 5 to 30 mPa·S at 20° C.

20. A method of forming a wiring on an insulating substrate, comprising:

partitioning a surface of the insulating substrate into wiring regions using a photoresist film forming a reverse tapered cross section;

injecting an ink comprising nanoparticles on the wiring region using an ink-jet process;

leveling the ink formed on the wiring region;

drying the ink which has been leveled;

separating the photoresist film from the substrate; and

baking the ink on the wiring region.