Carbon grit
Plasma assisted chemical vapor deposition is used to form single crystal diamond from a seed and methane. A susceptor is used to support the seed. Under certain conditions, crystalline grit is formed in addition to the diamond. The crystalline grit in one embodiment comprises mono crystals or twin crystals of carbon, each having its own nucleus. The crystals form in columns or tendrils to the side of the monocrystalline diamond or off a side of the susceptor. The crystals may have bonding imperfections which simulate doping, providing conductivity. They may also be directly doped. Many tools may be coated with the grit.
1. A method comprising:
creating nucleation sites on a substrate;
wherein the creating nucleation sites includes polishing the substrate with diamond grit and leaving some diamond grit particles embedded in the substrate, and wherein the diamond grit comprises diamond monocrystals;
evacuating a CVD (chemical vapor deposition) chamber and backfilling the chamber to about 40 torr with hydrogen;
heating a susceptor in the chamber to a temperature of at least approximately 600° C.;
applying power to a heat source;
supplying a carbon source and a boron source to form a plasma proximate the heat source;
forming atomic hydrogen proximate the susceptor; and
growing carbon crystal grit comprising carbon and boron on the substrate about the nucleation sites.
2. The method of claim 1 wherein the carbon crystal grit forms diamond monocrystals in columns or tendrils.
3. The method of claim 2 wherein the monocrystals have their own nucleus.
4. The method of claim 1 wherein the carbon crystal grit forms diamond monocrystals in a cauliflower type shape.
5. The method of claim 1 wherein the carbon crystal grit comprises dense micro/nano crystal clusters.
6. The method of claim 1 wherein the carbon crystal grit comprises twin crystals.
7. The method of claim 1 and further comprising growing a monocrystalline diamond on the seed, and wherein the carbon crystal grit forms on sides of the monocrystalline diamond.
8. A method comprising:
creating nucleation sites on a substrate;
wherein the creating nucleation sites includes polishing the substrate with diamond grit and leaving some diamond grit particles embedded in the substrate, and wherein the diamond grit comprises diamond monocrystals;
evacuating a CVD (chemical vapor deposition) chamber and backfilling the chamber to about 40 torr with hydrogen;
heating a susceptor in the chamber to a temperature of at least approximately 600° C.;
applying power to a heat source;
supplying boron and a gas including at least approximately at least 1% methane to form a plasma proximate the heat source; and
growing carbon crystal grit comprising carbon and boron.
9. A method comprising:
creating nucleation sites on a substrate by thermal cycling of the substrate to create cracks in the substrate;
growing carbon crystal grit on the substrate in a plasma assisted CVD chamber with a supply gas of approximately 18% to 25% methane heated to form a plasma cloud, wherein the grit comprises carbon and boron and wherein the carbon crystal grit is thermally distinct from the susceptor.
10. The method of claim 9 and further comprising adding borane to the CVD chamber.
11. The method of claim 9 wherein the carbon crystal grit is grown at a rate of between approximately 20 to 50 um/hour.
12. The method of claim 9 wherein the carbon crystal grit is grown in the form of nano-crystals.
13. The method of claim 12 wherein the nano-crystals comprise bonding imperfections.
14. The method of claim 13 wherein the bonding imperfections create holes for conductivity.
15. The method of claim 9 wherein the carbon crystal grit is conductive.
16. The method of claim 9 and further comprising polishing the grown carbon crystal grit.
17. The method of claim 16 wherein the carbon crystal grit polishes at approximately 1/10 the rate of synthetic diamond.
18. The method of claim 16 wherein the carbon crystal grit is polished in a 100 plane.
19. The method of claim 9 wherein the methane contains controlled amounts of different carbon isotopes.
20. A method comprising:
roughening a surface of a substrate to create multiple nucleation points including embedding diamond particles in the substrate;
heating the substrate in a CVD (chemical vapor deposition) chamber to a temperature of at least approximately 600° C.;
applying power to a heat source;
supplying a carbon source and a boron source to form a plasma proximate the heat source;
forming atomic hydrogen proximate the substrate; and
growing carbon crystal grit comprising carbon and boron.
21. The method of claim 20 wherein the carbon crystal grit comprises nano-clusters of carbon having a hardness greater than mined diamond.