Method of cleaning an aluminum drum substrate for an electrophotographic photoconductor
View Patent ↗A method of cleaning an aluminum drum substrate that removes cutting chips, and degreases to remove high viscosity drawing oil used in a cold drawing process, without using a chlorine-containing organic solvent. A plurality of aluminum drum substrates are arranged in rows, with an axis of each drum substrate being vertical and parallel with the axis of the other drum substrates. A cleaning liquid is ejected at a predetermined ejection pressure from a high-pressure cleaning nozzle. The cleaning liquid is ejected in a fan shape having a predetermined spread angle and from above a top opening of one of the drum substrates towards the drum substrate. While ejecting the cleaning liquid, the nozzle is horizontally and sequentially traversed above openings of the other drum substrates in a direction of the row, while swinging the nozzle in the direction of the row.
1. A method of cleaning an aluminum drum substrate for an electrophotographic photoconductor, comprising:
forming a plurality of aluminum drum substrates using cold drawing and cutting operations;
after said forming, arranging the plurality of aluminum drum substrates in rows, with an axis of each drum substrate being vertical and parallel with the axis of the other drum substrates;
ejecting a cleaning liquid at a predetermined ejection pressure from a high pressure cleaning nozzle, the cleaning liquid being ejected in a fan shape having a predetermined spread angle and from above a top opening of one of the drum substrates towards the drum substrate; and
while ejecting the cleaning liquid, horizontally and sequentially traversing the nozzle above openings of the other drum substrates in a direction of the row, while swinging the nozzle in the direction of the row.
2. The method of cleaning an aluminum drum substrate according to claim 1 , wherein
h≧ Φ(2 tan (θ/2)),
where Φ is a diameter of the drum substrate, θ is the spread angle of the cleaning liquid, and h is a distance between a top of the drum substrate and a nozzle hole.
3. The method of cleaning an aluminum drum substrate according to claim 1 , further comprising immersing, after said traversing, the drum substrates in a warm pure water bath, and drying the drum substrates with hot air.
4. The method of cleaning an aluminum drum substrate according to claim 2 , wherein the cleaning liquid is one of an alkaline cleaning agent or an alkaline electrolytic solution exhibiting a pH value in a range of 8 to 12, and wherein the ejection pressure is in a range of 4.9×10 6 Pa to 2.94×10 7 Pa.
5. The method of cleaning an aluminum drum substrate according to claim 2 , wherein the cleaning liquid is pure water, and wherein the ejection pressure is in a range of 1.96×10 7 Pa to 2.94×10 7 Pa.
6. The method of cleaning an aluminum drum substrate according to claim 4 , wherein the cleaning liquid is pressurized and supplied using a high pressure plunger pump connected through piping to the cleaning nozzle.
7. The method of cleaning an aluminum drum substrate according to claim 1 , wherein the traversing includes traversing the nozzle in a first direction, above the openings of the drum substrates of a first row, and subsequently traversing the nozzle in a second direction that is opposite to the first direction, above the openings of the drum substrates of a second row.
8. The method of cleaning an aluminum drum substrate according to claim 4 , wherein the traversing includes traversing the nozzle in forward and backward directions along the rows at a velocity in a range of 3 mm/s to 8 mm/s.
9. The method of cleaning an aluminum drum substrate according to claim 8 , wherein the nozzle is swung with an angle of swing motion in a range of 15 degrees to 25 degrees.
10. The method of cleaning an aluminum drum substrate according to claim 2 , further comprising immersing, after said traversing, the drum substrates in a warm pure water bath, and drying the drum substrates with hot air.
11. The method of cleaning an aluminum drum substrate according to claim 5 , wherein the cleaning liquid is pressurized and supplied using a high pressure plunger pump connected through piping to the cleaning nozzle.
12. The method of cleaning an aluminum drum substrate according to claim 2 , wherein the nozzle is traversed in a first direction, above the openings of the drum substrates of a first row, and subsequently traversed in a second direction that is opposite to the first direction, above the openings of the drum substrates of a second row.
13. The method of cleaning an aluminum drum substrate according to claim 5 , wherein the traversing includes traversing the nozzle in forward and backward directions along the rows at a velocity in a range of 3 mm/s to 8 mm/s.
14. The method of cleaning an aluminum drum substrate according to claim 13 , wherein the nozzle is swung with an angle of swing motion in a range of 15 degrees to 25 degrees.