Composition and method for removing copper-compatible resist
View Patent ↗A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
1. A method for removing a copper-compatible resist, comprising:
providing a composition, including combining about 10% to about 30% by weight of an amine compound with about 10% to about 80% by weight of a glycolether compound and about 10% to about 80% by weight of a polar solvent, wherein the composition consists of only three materials which are the amine compound, the glycolether compound and the polar solvent; and
removing a copper-compatible resist using the composition.
2. The method according to claim 1 , wherein the amine compound includes at least one of N-methylethanolamine, N-ethylethanolamine, diethylethanolamine and dimethylethanolamine.
3. The method according to claim 1 , wherein the glycolether compound includes at least one of ethyleneglycolethylether, ethyleneglycolmethylether, ethyleneglycolbutylether, diethyleneglycolbutylether, diethyleneglycolethylether, diethyleneglycolmethylether and diethyleneglycolpropylether.
4. The method according to claim 1 , wherein the glycolether compound has a boiling point more than about 180° C.
5. The method according to claim 1 , wherein the polar solvent includes at least one of N-methyl-2-pyrrolidinone, N,N-dimethylacetamide, N,N-dimethylpormamide and N,N-dimethylimidazole.
6. The method according to claim 1 , wherein the amine compound includes N-methylethanolamine, the glycolether compound includes at least one of diethyleneglycolethylether and diethyleneglycolpropylether, and the polar solvent includes N-methyl-2-pyrrolidinone.
7. The method according to claim 1 , wherein the glycolether compound has a molecular weight of less than about 150.