Submerged gas evaporators and reactors
A submerged gas processor in the form of an evaporator or a submerged gas reactor includes a vessel, a gas delivery tube partially disposed within the vessel to deliver a gas into the vessel and a process fluid inlet that provides a process fluid to the vessel at a rate sufficient to maintain a controlled constant level of fluid within the vessel. A weir is disposed within the vessel adjacent the gas delivery tube to form a first fluid circulation path between a first weir end and a wall of the vessel and a second fluid circulation path between a second weir end and an upper end of the vessel. During operation, gas introduced through the tube mixes with the process fluid and the combined gas and fluid flow at a high rate with a high degree of turbulence along the first and second circulation paths defined around the weir, thereby promoting vigorous mixing and intimate contact between the gas and the process fluid. This turbulent flow develops a significant amount of interfacial surface area between the gas and the process fluid resulting in a reduction of the required residence time of the gas within the process fluid to; achieve thermal equilibrium and/or to drive chemical reactions to completion, all of which leads to a more efficient and complete evaporation, chemical reaction, or combined evaporation and chemical reaction process.
1. A submerged gas processor comprising:
a vessel having an interior adapted to hold a liquid;
a tube disposed within the vessel and adapted to transport a gas into the interior of the vessel;
a weir disposed within the vessel adjacent the tube in a manner that defines a confined volume between the tube and the weir;
an exhaust stack adapted to transport exhaust gases from the interior of the vessel;
a liquid inlet adapted to supply a liquid to the interior of the vessel; and
a liquid outlet adapted to remove liquid from the interior of the vessel;
wherein the weir includes a first weir end and a second weir end and is disposed within the vessel to define a first circulation gap between the first weir end and a first wall of the vessel and to define a second circulation gap between the second weir end and a second wall of the vessel which enables liquid within the vessel to flow through the first and second circulation gaps when gas is introduced into the vessel from the tube, and wherein a ratio of a cross-sectional area of the vessel to a cross-sectional area of a confined volume between the weir and the tube is in the range of approximately 10:1 to approximately 14:1.
2. The submerged gas processor of claim 1 further including a baffle disposed proximate the second circulation gap and generally perpendicular to the weir.
3. The submerged gas processor of claim 2 , wherein the distance between the second weir end and the baffle is in the range of 1 to 20 inches.
4. The submerged gas processor of claim 2 , wherein the baffle is attached to the tube.
5. The submerged gas processor of claim 1 , wherein the tube includes a gas exit disposed below a surface of the liquid when liquid is disposed within the vessel.
6. The submerged gas processor of claim 5 , further including a plurality of gas exits disposed in the tube, wherein each gas exit is substantially rectangular in shape.
7. The submerged gas processor of claim 5 , wherein the tube is sized to deliver a ratio of gas flow in actual cubic feet per minute (acfm), as measured at the operating temperature of the gas flowing within the tube, to a cross sectional area of gas exit slots in the tube of between approximately 1,000 acfm/ft 2 and approximately 18,000 acfm/ft 2 .
8. The submerged gas processor of claim 5 , wherein the tube is sized to deliver a ratio of gas flow in actual cubic feet per minute (acfm), as measured at the operating temperature of the gas within the tube, to the cross sectional area of gas exit slots in the tube of between approximately 2,000 acfm/ft 2 and approximately 10,000 acfm/ft 2 .
9. The submerged gas processor of claim 1 , further including a support bracket attached to the vessel and attached to the weir.
10. The submerged gas processor of claim 9 , further including a stabilizer ring attached to the support bracket and disposed between the tube and the weir.
11. The submerged gas processor of claim 1 , wherein the tube is sized to deliver a ratio of gas flow in standard cubic feet per minute (scfm) out of the tube to a cross sectional area of the confined volume between the weir and the tube is in the range of approximately 200 scfm/ft 2 to approximately 10,000 scfm/ft 2 .
12. The submerged gas processor of claim 1 , wherein the tube is sized to deliver a ratio of gas flow in scfm out of the tube to a cross sectional area of the confined volume is in the range of approximately 500 scfm/ft 2 to approximately 6,000 scfm/ft 2 .
13. The submerged gas processor of claim 1 , wherein the weir comprises a tubular member disposed around the tube.
14. The submerged gas processor of claim 13 , wherein the tubular member is circular in cross section.
15. The submerged gas processor of claim 13 , wherein the tubular member is disposed co-axial to the tube.
16. The submerged gas processor of claim 1 , further including a burner that operates on gaseous or liquid fuel attached to the tube.
17. The submerged gas processor of claim 1 , wherein the tube is connected to a source of waste heat.
18. The submerged gas processor of claim 17 , wherein the source of the waste heat is one or a combination of a landfill gas processing device, a reciprocating internal combustion engine operating on landfill gas and/or a turbine operating on landfill gas.
19. The submerged gas processor of claim 1 , wherein the tube is connected to a source of heat.
20. The submerged gas processor of claim 19 , wherein the source of heat is a combustion device.
21. The submerged gas processor of claim 20 , wherein the combustion device includes one of a biogas inlet, a solid fuel inlet, a liquid fuel inlet and a gaseous fuel inlet.