Tissue resurfacing
A method for skin treatment comprises the steps of delivering at least one pulse of radio frequency power to at least one electrode in order to create an electric field; passing gas through the electric field in order to form plasma from the gas; and applying the plasma to the surface of skin. The amount of radio frequency power may be relatively low such that the application of plasma causes denaturation of collagen within the collagen-containing tissue beneath the skin surface, which may promote the generation of new collagen within the collagen-containing tissue.
1 . An electrosurgical system having a generator for generating radio frequency power in or above the UHF range, wherein the system includes an isolation stage comprising a waveguide section and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes for connection respectively to a radio frequency power device and an output.
2 . A tissue resurfacing system having a generator for generating radio frequency power in or above the UHF range, wherein the system includes an isolation stage comprising a waveguide section and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes for connection respectively to a radio frequency power device and an output.
3 . The system according to claim 1 , characterised in that the radio frequency power device comprises a mangetron forming part of the generator.
4 . The system according to claim 1 , characterised in that the waveguide section is cylindrical.
5 . The system according claim 1 , characterised in that the waveguide section has a rectangular or other regular cross-section.
6 . The system according to claim 4 , characterised in that the waveguide section has end caps on each end.
7 . The system according to claim 1 , characterised in that the waveguide section comprises two interfitting portions, one portion fitting within and being overlapped by the other portion, the waveguide section further comprising an insulating dielectric layer between the said two portions in the region of the overlap.
8 . The system according to claim 1 , characterised in that the probes are E-field probes.
9 . The system according to claim 1 , characterised in that the probes are H-field elements in the form of loops.
10 . The system according to claim 1 , characterised in that the waveguide section has a wall in which are mounted first and second coaxial connectors, and in that each of the probes is positioned inside the waveguide as an extension of an inner conductor of a respective one of the coaxial connectors, the outer conductor being electrically continuous with the wall.
11 . The system according to claim 1 , characterised by being operable at a frequency in the region of 2.45 GHz.
12 . The system according to claim 11 , characterised in that the waveguide section is cylindrical and has a diameter in the range of from 70 to 100 mm.
13 . The system according to claim 1 , characterised in that the waveguide section has an interior cavity the length of which is nλ g /2 where n is an integer and λ g is the guide wavelength within the cavity.
14 . The system according to claim 4 , characterised in that the distance between each probe and its nearest end cap is in the region of an odd multiple of λ g /4, where λ g is the guide wavelength within an interior cavity of the waveguide section.
15 . The system according to claim 7 , characterised in that the axial extent of the overlap between the said waveguide portions is at least λ g /4, where λ g is the guide wavelength within an interior cavity of the waveguide section.
16 . The system according to claim 4 , characterised in that the length of the waveguide section between the end caps is about λ g , where λ g is the guide wavelength within an interior cavity of the waveguide section.
17 . An isolation stage for operation at frequencies in or above the UHF range, comprising a waveguide section and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes for connection respectively to a radio frequency power device and an output.
18 . A radio frequency generator forming part of an electrosurgical or tissue resurfacing system, characterised in that the generator includes an isolation stage according to claim 17 .
19 . The system according to claim 2 , characterised in that the radio frequency power device comprises a mangetron forming part of the generator.
20 . The system according to claim 2 , characterised in that the waveguide section is cylindrical.
21 . The system according claim 2 , characterised in that the waveguide section has a rectangular or other regular cross-section.
22 . The system according to claim 20 , characterised in that the waveguide section has end caps on each end.
23 . The system according to claim 2 , characterised in that the waveguide section comprises two interfitting portions, one portion fitting within and being overlapped by the other portion, the waveguide section further comprising an insulating dielectric layer between the said two portions in the region of the overlap.
24 . The system according to claim 2 , characterised in that the probes are E-field probes.
25 . The system according to claim 2 , characterised in that the probes are H-field elements in the form of loops.
26 . The system according to claim 2 , characterised in that the waveguide section has a wall in which are mounted first and second coaxial connectors, and in that each of the probes is positioned inside the waveguide as an extension of an inner conductor of a respective one of the coaxial connectors, the outer conductor being electrically continuous with the wall.
27 . The system according to claim 2 , characterised by being operable at a frequency in the region of 2.45 GHz.
28 . The system according to claim 27 , characterised in that the waveguide section is cylindrical and has a diameter in the range of from 70 to 100 mm.
29 . The system according to claim 2 , characterised in that the waveguide section has an interior cavity the length of which is nλ g /2 where n is an integer and λ g is the guide wavelength within the cavity.
30 . The system according to claim 20 , characterised in that the distance between each probe and its nearest end cap is in the region of an odd multiple of λ g /4, where λ g is the guide wavelength within an interior cavity of the waveguide section.
31 . The system according to claim 23 , characterised in that the axial extent of the overlap between the said waveguide portions is at least λ g /4, where λ g is the guide wavelength within an interior cavity of the waveguide section.
32 . The system according to claim 20 , characterised in that the length of the waveguide section between the end caps is about λ g , where λ g is the guide wavelength within an interior cavity of the waveguide section.