Methods to minimize contact resistance
View Patent ↗A method is disclosed for making a metal electrode which minimizes the contact resistance between it and an organic semiconductor. Acid-stabilized metal nanoparticles are deposited upon a substrate and annealed. This creates a metal electrode and releases acid. Upon deposition of semiconductor and subsequent annealing, the acid diffuses from the electrode into the semiconductor layer and acts as a dopant, minimizing the contact resistance. The use of oleic acid-stabilized silver nanoparticles is demonstrated.
1. A method for making an electronic device comprising:
providing acid-stabilized metal nanoparticles and a substrate which may optionally include a gate electrode and/or a dielectric layer;
depositing the acid-stabilized metal nanoparticles, followed by annealing to form one or more metal electrodes;
depositing a semiconductor layer with an optional annealing, wherein no or minimum contact resistance exist between the metal electrodes and the semiconductor layer.
2. The method of claim 1 , wherein the acid-stabilized metal nanoparticles are acid-stabilized silver nanoparticles.
3. The method of claim 1 , wherein the acid-stabilized metal nanoparticles are oleic acid-stabilized metal nanoparticles.
4. The method of claim 1 , wherein acid-stabilized metal nanoparticles are oleic acid-stabilized silver nanoparticles.
5. The method of claim 1 , wherein the step of providing acid-stabilized metal nanoparticles is performed by providing a mixture of acid-stabilized metal nanoparticles comprising different metals and/or different acids.
6. The method of claim 1 , wherein the acid of the acid-stabilized metal nanoparticles is selected from the group of organic acids containing from about 2 to about 30 carbon atoms.
7. The method of claim 1 , wherein the metal of the acid-stabilized metal nanoparticles is selected from the group consisting of silver, gold, platinum, copper, cobalt, indium, and nickel.
8. The method of claim 1 , wherein the step of depositing acid-stabilized metal nanoparticles is performed by a deposition method selected from the group consisting of printing, spraying, stamping, spinning-on, and dipping.
9. The method of claim 1 , wherein the step of depositing acid-stabilized metal nanoparticles is performed by:
depositing a dispersion comprising of acid-stabilized metal nanoparticles and a liquid; and
drying the deposited acid-stabilized metal nanoparticle features to remove the liquid and leave the acid-stabilized metal nanoparticles in the features.
10. The method of claim 1 , wherein the step of forming at least one metal electrode and releasing acid or chemically reacted acid is performed by annealing the acid-stabilized metal nanoparticle features to form at least one electrically conductive metal electrode and release acid or chemically reacted acid.
11. The method of claim 10 , wherein the annealing is performed at a temperature of from about 50° C. to about 250° C. for a period of from about 1 minute to about 120 minutes.
12. The method of claim 1 , wherein the step of depositing the semiconductor layer is prior to the step of depositing of the acid-stabilized metal nanoparticles.
13. The method of claim 1 , wherein the step of optional annealing the deposited acid-stabilized nanoparticles and the semiconductor layer is performed by annealing at a temperature of from about 50° C. to about 250° C. for a period of from about 5 minutes to about 120 minutes.
14. The method of claim 1 , wherein the acid or chemically reacted acid from the acid-stabilized metal nanoparticles diffuses into the semiconductor layer and forms a contact region, which eliminates or minimizes the contact resistance.
15. The electronic device produced by the method of claim 1 .