Method for manufacturing a perpendicular magnetic recording transducer
View Patent ↗A method and system for fabricating a perpendicular magnetic recording head, and the head so formed, are described. The method includes depositing an underlayer directly on an insulating layer. The underlayer preferably includes at least one of a nonferromagnetic metal, silicon oxide, and silicon nitride. A pole layer, which has a pole removal rate, is provided on the underlayer. The method and system further include forming a perpendicular magnetic recording pole from the pole layer. The perpendicular magnetic recording pole has a top and a bottom that is narrower than the top. The process of forming the perpendicular magnetic recording pole further includes removing a portion of the pole layer such that a pole removal rate for the pole layer is less than or substantially equal to a removal rate of the underlayer during the removing step.
1. A method for manufacturing a perpendicular magnetic recording transducer comprising:
depositing an underlayer directly on an insulating layer, the underlayer including at least one of a nonferromagnetic metal, silicon oxide and silicon nitride;
providing a pole layer on the underlayer; and
forming a perpendicular magnetic recording pole from the pole layer, the perpendicular magnetic recording pole having a top, a bottom narrower than the top, the forming further including
removing a portion of the pole layer, a pole removal rate for the pole layer being less than or substantially equal to a removal rate of the underlayer during the removing.
2. The method of claim 1 wherein the underlayer depositing further includes:
depositing at least one of NiNb, Ru, Rh, NiFeCr, silicon oxide, and silicon nitride.
3. The method of claim 1 wherein the underlayer depositing further includes:
depositing a laminate having a plurality of layers including at least one of NiNb, Ru, Rh, and NiFeCr.
4. The method of claim 1 further comprising:
depositing an intermediate layer between the underlayer and the pole layer, the intermediate layer having a thickness of not more than one thousand Angstroms.
5. The method of claim 4 wherein the intermediate layer has a thickness of not more than one hundred Angstroms.
6. The method of claim 4 wherein the underlayer includes NiNb/Ta and wherein the intermediate layer includes Ta.
7. The method of claim 4 wherein the perpendicular magnetic recording pole has pole a thickness and wherein the underlayer depositing further includes:
depositing the underlayer at the thickness substantially equal to the pole thickness.
8. The method of claim 1 wherein the underlayer depositing further includes:
depositing the underlayer at a thickness of at least five hundred Angstroms.
9. The method of claim 1 further comprising:
fabricating a chemical mechanical planarization (CMP) stop layer on the pole layer prior to the forming step.
10. The method of claim 9 further comprising:
fabricating hard mask layer on the CMP stop layer prior to the forming step.
11. The method of claim 10 further comprising:
creating a mask on the hard mask layer prior to the forming step.
12. The method of claim 11 wherein the mask creating further includes:
forming a photoresist mask on the hard mask layer.
13. The method of claim 11 wherein the mask creating further includes:
forming a hard mask on the hard mask layer.
14. The method of claim 13 wherein the hard mask includes NiFe.
15. The method of claim 11 wherein the removing further includes:
removing a portion of the hard mask layer and a portion of the CMP stop layer.
16. The method of claim 15 wherein the forming further includes:
performing a pole trim to provide the perpendicular magnetic recording pole.
17. The method of claim 1 wherein the underlayer has a back and a terminus surface, the method further comprising:
providing a flux guide having a front adjacent to the underlayer, a second portion of the perpendicular magnetic recording pole being on the flux guide.
18. The method of claim 17 further comprising:
providing a back gap under a portion of the flux guide distant from the front of the flux guide and from the terminus surface of the underlayer.
19. The method of claim 1 wherein the underlayer has a back and a terminus surface, the method further comprising:
providing a flux guide residing on a second portion of the perpendicular magnetic recording pole.
20. The method of claim 1 further comprising:
providing a shield gap on a second portion of the flux guide; and
providing a shield above the shield gap.
21. The method of claim 20 wherein the underlayer has a back and a terminus surface, method further comprising:
providing a flux guide having a front adjacent to the underlayer, a second portion of the perpendicular magnetic recording pole being on the flux guide.
22. The method of claim 20 wherein the underlayer has a back and a terminus surface, the method further comprising:
providing a flux guide residing on a second portion of the perpendicular magnetic recording pole.
23. The method of claim 1 wherein the perpendicular magnetic recording pole has a side, the side substantially forming a plane.
24. The method of claim 1 wherein the perpendicular magnetic recording pole has a side, the side having an angle with respect to a vertical direction that is nonzero and at least two degrees.
25. The method of claim 24 wherein the angle is at least five degrees and not more than eight degrees.
26. The method of claim 1 wherein the underlayer includes the nonferromagnetic metal.