IP Library Granted Patent US 7,422,383
Granted Patent B2
US 7,422,383 · App. 11/193,622 · Granted Sep 9, 2008

Photosensitive material processor

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Quick Facts
Patent No.
US 7,422,383
App. No.
11/193,622
Granted
Sep 9, 2008
Kind
B2
Abstract

Developer is supplied to a first spray pipe disposed in a developing bath. The inside of the developing bath is provided with a heater. A liquid-flow generating unit comprises a liquid-flow generating head and a branch duct, which is connected to a branch pipe of the first spray pipe via a rubber hose. A part of the developer flowing in the first spray pipe is forwarded to the liquid-flow generating head. By a gap-forming ring, a gap is secured between an outer surface of the heater and an inner surface of the liquid-flow generating head so that the developer uniformly flows along the outer surface of the heater in a longitudinal direction thereof. A heater cover is attached to the liquid-flow generating head. An inner surface of the heater cover inclines in the longitudinal direction of the heater.

Claims (52)

1. A photosensitive material processor for processing a photosensitive material with a processing liquid, comprising

a processing bath for containing said processing liquid;

a heater disposed in said processing bath to heat said processing liquid; and

a liquid-flow generator attached so as to cover said heater and for forming a flow of said processing liquid near a circumferential surface of said heater,

wherein said liquid-flow generator comprises:

a liquid-flow generating head having an outflow opening formed between the circumferential surface of said heater and said liquid-flow generating head, said processing liquid being supplied from said processing-liquid supplying pipe to said liquid-flow generating head.

2. A photosensitive material processor according to claim 1 , wherein said heater is made in a rod shape and said liquid-flow generator forms the flow of said processing liquid in a longitudinal direction of said heater.

3. A photosensitive material processor according to claim 2 , further comprising:

a processing-liquid supplying pipe for supplying said processing liquid into said processing bath; and

a processing-liquid circulator for circulating said processing liquid, which is contained in said processing bath, via said processing-liquid supplying pipe after said processing liquid has been discharged through a discharge port.

4. A photosensitive material processor according to claim 1 , wherein said liquid-flow generating head comprises:

a gap-keeping member for maintaining a first gap, which is formed between the circumferential surface of said heater and said liquid-flow generating head, in a constant state.

5. A photosensitive material processor according to claim 4 , wherein said gap-keeping member has a ring shape, and a plurality of ribs for abutting on the circumferential surface of said heater are formed on an inner surface of said gap-keeping member.

6. A photosensitive material processor according to claim 5 , wherein said ribs are disposed on the inner surface of said gap-keeping member at regular intervals.

7. A photosensitive material processor according to claim 1 , wherein said liquid-flow generator further comprises:

a tubular guide cover attached to said liquid-flow generating head, said guide cover surrounding said heater and guiding said processing liquid, which has flowed out through said outflow opening, in the longitudinal direction of said heater.

8. A photosensitive material processor according to claim 7 , wherein a second gap formed between said guide cover and said heater becomes gradually narrower in the longitudinal direction of said heater.

9. A photosensitive material processor according to claim 7 , wherein said liquid-flow generating head and said guide cover are removably attached.

10. A photosensitive material processor according to claim 1 , wherein said liquid-flow generator is connected to a branch pipe formed on said processing-liquid supplying pipe, and a part of said processing liquid flowing in said processing-liquid supplying pipe is forwarded to said liquid-flow generator.

11. A photosensitive material processor according to claim 10 , wherein said liquid-flow generator is connected to said branch pipe of said processing-liquid supplying pipe via a rubber hose.

12. A photosensitive material processor according to claim 11 , wherein said discharge port is formed at the bottom of said processing bath.

13. A photosensitive material processor according to claim 12 , wherein said processing liquid discharged from said discharge port is forwarded to said processing-liquid supplying pipe through a filter.

14. A photosensitive material processor according to claim 1 , wherein a flow velocity of said processing liquid is 0.05 m/Sec to 5.0 m/Sec at the circumferential surface of said heater.

15. A photosensitive material processor according to claim 1 , further comprising:

a heater controller for controlling said heater, said heater controller controlling said heater in accordance with a content of image colorant transferred into said processing liquid.

16. A photosensitive material processor according to claim 15 , wherein said heater controller calculates a rate of the content of said image colorant to control said heater on the basis of a duty ratio determined from said rate of the content.

17. A photosensitive material processor according to claim 16 , wherein said processing liquid is a developer for developing said photosensitive material.

18. A photosensitive material processor according to claim 1 , wherein a bottom of the processing bath is inclined toward a central section, and the heater is disposed in the central section.

19. A photosensitive material processor according to claim 1 , wherein a temperature measurement device is connected to said heater in order to control the heater on and off to maintain a temperature of the processing liquid.

20. A photosensitive material processor according to claim 19 , wherein the temperature measurement device is disposed in a discharge pipe of the processing bath.

21. A photosensitive material processor according to claim 19 , wherein the temperature measurement device is disposed in the processing bath.

22. A photosensitive material processor according to claim 1 , wherein said liquid-flow generating head comprises:

a gap-keeping member for maintaining a first gap, which is formed between an outer circumferential surface of said heater and said an inner circumferential surface of said liquid-flow generating head.

23. A photosensitive material processor for processing a photosensitive material with a processing liquid, comprising

a processing bath for containing said processing liquid;

a heater disposed in said processing bath to heat said processing liquid; and

a liquid-flow generator attached so as to cover said heater and for forming a flow of said processing liquid near a circumferential surface of said heater;

wherein said liquid-flow generator comprises:

a liquid-flow generating head having an outflow opening formed between the circumferential surface of said heater and said liquid-flow generating head, said processing liquid being supplied from a processing-liquid supplying pipe to said liquid-flow generating head; and

wherein said heater is made in a rod shape and said liquid-flow generator forms the flow of said processing liquid in a longitudinal direction of said heater.

24. A photosensitive material processor according to claim 23 , wherein said liquid-flow generating head comprises:

a gap-keeping member for maintaining a first gap, which is formed between the circumferential surface of said heater and said liquid-flow generating head, in a constant state.

25. A photosensitive material processor according to claim 24 , wherein said gap-keeping member has a ring shape, and a plurality of ribs for abutting on the circumferential surface of said heater are formed on an inner surface of said gap-keeping member.

26. A photosensitive material processor according to claim 25 , wherein said ribs are disposed on the inner surface of said gap-keeping member at regular intervals.

27. A photosensitive material processor according to claim 23 , wherein said liquid-flow generator further comprises:

a tubular guide cover attached to said liquid-flow generating head, said guide cover surrounding said heater and guiding said processing liquid, which has flowed out through said outflow opening, in the longitudinal direction of said heater.

28. A photosensitive material processor according to claim 27 , wherein a second gap formed between said guide cover and said heater becomes gradually narrower in the longitudinal direction of said heater.

29. A photosensitive material processor according to claim 27 , wherein said liquid-flow generating head and said guide cover are removably attached.

30. A photosensitive material processor according to claim 23 , wherein said liquid-flow generator is connected to a branch pipe formed on said processing-liquid supplying pipe, and a part of said processing liquid flowing in said processing-liquid supplying pipe is forwarded to said liquid-flow generator.

31. A photosensitive material processor according to claim 30 , wherein said liquid-flow generator is connected to said branch pipe of said processing-liquid supplying pipe via a rubber hose.

32. A photosensitive material processor according to claim 31 , wherein said discharge port is formed at the bottom of said processing bath.

33. A photosensitive material processor according to claim 32 , wherein said processing liquid discharged from said discharge port is forwarded to said processing-liquid supplying pipe through a filter.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 30, 2005
From: NOZAWA, RYOEI; YAMAMOTO, HIDETO; SUYA, TOSHIHIRO; HIBE, DAISUKE; ADACHI, KEIICHI
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 017290/0006 →