Silica sols with controlled minimum particle size and preparation thereof
Colloidal silica having an increased particle size and narrow particle size distribution is disclosed. A method for continuously producing the desired colloidal composition is disclosed comprising the steps of providing preformed silica particles having a surface area which controls the particle size of the colloidal silica product, adding a feed silica comprising an alkaline solution and silicate at a feed rate which is less than a nucleation rate, and increasing the feed rate as the feed silica is added wherein the feed rate is less than the nucleation rate.
1 . A method for continuously producing colloidal silica particles having a controlled minimum particle size comprising the steps of:
a) providing a preformed silica sol particles of predetermined minimum particle size to at least one agitated, heated reactor;
b) adding feed silica comprising an alkaline agent and silicic acid to the reactor; at a rate which is less than a rate of nucleation of the colloidal silica;
wherein the minimum particle size of the resulting colloidal silica is controlled by the particle size of the preformed silica sol.
2 . The method of claim 1 , wherein the preformed silica sol has a narrow particle size distribution.
3 . The method of claim 1 , wherein the minimum particle size and particle size distribution of the resulting colloidal silica are controlled by the preformed silica sol.
4 . The method of claim 1 , wherein the silica feed rate is dependent on the reactor volume.
5 . The method of claim 1 , wherein the characteristics of the resulting colloidal silica is dependent on the rate of the feed silica.
6 . The method of claim 5 , wherein the rate of the feed silica is maintained below the nucleation rate of the colloidal silica particles.
7 . The method of claim 1 , wherein the reactor is held at a constant volume by continuous removal of the resulting colloidal silica from one or more reactors.
8 . The method of claim 7 , wherein the reactor volume is directly proportional to the rate of the feed silica.
9 . The method of claim 1 , wherein the rate of adding the feed silica is adjusted as a function of the total colloidal silica surface area.
10 . A method for continuously producing colloidal silica particles having a desired particle size and particle size distribution comprising:
(a) identifying the desired size and distribution of the particle size of the colloidal silica;
(b) providing a preformed silica sol particles of predetermined minimum particle size to at least one reactor;
(c) adding feed silica comprising silicic acid and an alkaline agent to the colloidal silica particles at an addition rate sufficient to prevent nucleation of new silica particles;
(d) continuously adjusting the feed to increase the size of the colloidal silica particles and prevent nucleation of new silica; and
(e) maximizing the amount of colloidal silica particles produced.
11 . The method of claim 10 , wherein the size of colloidal silica particles produced is uniform.
12 . The method of claim 10 , further comprising adding a metal to the colloidal silica.
13 . The method of claim 14 , further comprising adding a metal to the colloidal silica.
14 . A colloidal silica composition optionally comprising a metal having an increased particle size and narrow particle size distribution.
15 . A colloidal silica composition produced by a continuous process in at least one reactor, the process compromising adding preformed silica sol particles of predetermined minimum particle size to the reactor, adding a feed silica comprising silicic acid and an alkaline agent to the colloidal silica particles at an addition rate sufficient to prevent nucleation of new silica particles; continuously adjusting the feed to increase the size of the colloidal silica particles and prevent nucleation of new silica; and maximizing the amount of colloidal silica particles produced.
16 . A colloidal silica composition produced by the method of claim 1 .
17 . A colloidal silica composition produced by the method of claim 10 .
18 . A colloidal silica composition produced by the method of claim 13 .
19 . A colloidal silica composition of claim 14 useful in chemical mechanical polishing, wafer polishing, catalyst supports, investment casting or refractories.
20 . A polishing composition comprising a polymeric core surrounded by embedded inorganic particles comprising the composition of claim 14 .
21 . A water based slurry for use as a backup coat on a wax model utilized in the lost wax investment casting technique, said slurry compromising the composition of claim 14 .
22 . A method for coating a wax model to form a shell utilizable in a lost wax investment casting technique, comprising coating the wax model with at least one prime coat of a water based slurry containing a colloidal silica of claim 14.