Process for preparing polyarylate having high thermo-resistance and high transparency

1. A process for preparing polyarylate, by reacting an alkaline aqueous solution of a bivalent phenol monomer having the structure of Formula 1 in contact with a solution of an aromatic dicarboxylic acid halogen compound in a hydrophobic organic solvent in the presence of a nonionic surfactant having 4˜20 of HLB,

wherein, R1, R2, R3 and R4 are hydrogen, C 1 ˜C 12 alkyl, aryl or halogen independently; W is C 1 ˜C 30 alkylidene, C 2 ˜C 30 alkylene, C 3 ˜C 30 cycloalkylidene, C 3 ˜C 30 cycloalkene, C 2 ˜C 30 alkylene substituted for phenyl, oxygen, sulfur, sulfoxide, sulfone or single bond.

2. The process for preparing polyarylate according to claim 1 , wherein the nonionic surfactant is at least one selected from a group comprising polyoxy ethylene lauryl ether, polyoxyethylene nonylphenyl ether, octylphenoxy polyethoxy ethanol, polyoxyethylene-polyoxypropylene block copolymer, sorbitol anhydride, ethoxylated fatty acid alcohol, ethoxylated fatty acid, ethoxylated alkyl phenol, alkanolamide (fatty acid alkanolamide), ethoxylated fatty acid alkanolamide, fatty acid amine oxide, fatty acid amido amine oxide, glyceryl fatty acid ester, sorbitan, polyoxyethylene sorbitan tristearate, ethoxylated sorbitan ester, alkyl polyglycoside, ethylene/propylene oxide block copolymer, and ethoxylated-propoxylated fatty acid alcohol.

3. The process for preparing polyarylate according to claim 1 , wherein the nonionic surface-active agent is added in 0.05˜20 wt % per 100 wt % of a bivalent phenol compound.

4. The process for preparing polyarylate according to claim 1 , wherein the bivalent phenol compound can be at least one selected from the group comprising bis(4-hydroxyphenyl)methane, 2,2-bis(4-hydroxyphenyl)propane, 1,1-bis(4-hydroxyphenyl)ethane, 2,2-bis(4-hydroxy-3-methylphenyl)propane, 2,2-bis(4-hydroxyphenyl)heptane, 2,2-bis(4-hydroxy-3,5-dichlorophenyl)propane, 2,2-bis(4-hydroxy-2,5-dibromophenyl)propane, bis(4-hydroxyphenyl)phenylmethane, 4,4-dihydroxyphenyl-1,1-m-diisopropylbenzene, 4,4-dihydroxyphenyl-9,9-fluorene, 1,1-bis(4,4-dihydroxyphenyl)cyclopentane, 1,1-bis(4,4-dihydroxyphenyl)cyclohexane, 1-methyl-1(4-hydroxyphenyl)-4-(dimethyl-4-hydroxyphenyl)methylcyclohexane, 4-{1-[3-(4-hydroxyphenyl)-4-methylcyclohexyl]-1-methylethyl}phenol, 4,4-[1-methyl-4-(1-methylethyl)-1,3-cyclohexanediyl]bisphenol, 2,2,2,2-tetrahydro-3,3,3,3-tetramethyl-1,1-spirobis-[1H]-ynedene]-6,6-diol, bis(4-hydroxyphenyl)ether, bis(4-hydroxy-3,5-dichlorophenyl)ether, 4,4-dihydroxy-3,3-dimethyiphenylether, 4,4-dihydroxydiphenylsulfide, 4,4-dihydoxy-3,3-dimethyldiphenylsulfide, 4,4-dihydroxydiphenylsulfoxide, 4,4-dihydroxy-3,3-dimethyldiphenylsulfoxide, 4,4-dihydroxydiphenylsulfone, 4,4-dihydroxy-3,3-dimethyldiphenylsulfone, 4,4-dihydoxydiphenyl-3,3-isatine, resocine, 3-methylresocine, 3-ethylresocine, 3-butylresocine, 3-t-butylresocine, 3-phenylresocine, 3-cumylresocine, 4,4′-dihydroxydiphenyl, and 3,3′-dichloro-4,4′-dihydroxydiphenyl.

5. The process for preparing polyarylate according to claim 1 , wherein the aromatic dicarboxylic acid can be at least one selected from the group comprising terephthalic acid, isophthalic acid, dibenzo acid, naphthalene dicarboxylic acid, bis(4-carboxyphenyl)methane, 1,2-bis(4-carboxyphenyl)ethane, 2,2-bis(4-carboxyphenyl)propane, bis(4-carboxyphenyl)oxide, bis(4-carboxyphenyl)sulfide, bis(4-carboxyphenyl)sulfone and other aromatic dicarboxylic acids substituted for the aromatic group of above compounds by C 1 ˜C 2 alkyl or halogen.