Electron beam apparatus
View Patent ↗An electron beam ( 4 ) to be irradiated onto a sample ( 10 ) is two-dimensionally scanned by a scanning coil ( 9 ), and secondary electrons generated from the sample ( 10 ) by the scanning are detected by a secondary electron detector ( 13 ). A deflection coil ( 15 ) for image shifting is used for electrically deflecting the primary electron beam to shift a field of view for image shift in an arbitrary direction by an arbitrary amount. By the image shift, the primary electron beam ( 4 ) to be irradiated onto the sample is energy dispersed to degrade the resolution. However, an E×B field producer ( 30 ) for dispersion control gives the primary electron beam energy dispersion in the opposite direction and having the equal magnitude. Therefore, the energy dispersion produced in the primary electron beam by the image shift is automatically corrected.
1. An electron beam apparatus comprising:
an electron source for emitting an electron beam;
a focusing lens for focusing said electron beam;
an objective lens for generating a focusing field which focuses the electron beam on a sample; and
an image shift deflector for deflecting for deflecting the electron beam by moving a field of view from an optical axis of the electron beam apparatus, making the electron beam pass through an intersection point of the optical axis with the focusing field, the image shift deflector further comprising:
an energy dispersion unit for generating an energy dispersion field which disperses energy of the electron beam; and
an energy dispersion control unit for adjusting the energy dispersion field according to distance amount of the field of view by the image shift deflector.
2. An electron beam apparatus according to claim 1 , wherein:
said energy dispersion unit comprises a unit for producing an E×B field, and
said E×B field contains an electric field and a magnetic field intersecting each other on the axis of said electron beam.
3. An electron beam apparatus according to claim 2 , wherein said E×B field produces the energy dispersion in directions intersecting each other at right angle on said plane intersecting an axis of said electron beam.
4. An electron beam apparatus according to claim 2 , wherein said E×B field does not produce any deflecting action to said electron beam.
5. An electron beam apparatus according to claim 2 , wherein said E×B field comprises:
first and second electric field components intersecting each other and independently controllable; and
a first and a second magnetic field components intersecting said first and said second electric field components and independently controllable.
6. An electron beam apparatus according to claim 1 , wherein:
said image shift deflector comprises a unit for producing an acceleration voltage for accelerating said electron beam; and
said energy dispersion unit is controlled in linkage with said acceleration voltage of said electron beam.
7. An electron beam apparatus according to claim 1 , wherein: said image shift deflector comprises a unit for applying a voltage to said sample; and
said energy dispersion unit is controlled in linkage with said voltage applied to said sample.
8. An electron beam apparatus according to claim 1 , wherein:
image shift deflector comprises a temporary acceleration means for producing a positive electric potential for temporarily accelerating said electron beam to be irradiated onto said sample; and
said energy dispersion unit is controlled in linkage with said temporary acceleration electric potential.
9. An electron beam apparatus according to claim 1 , wherein said energy dispersion unit is controlled in linkage with said exciting current.
10. An electron beam apparatus according to claim 1 , wherein:
said image shift deflector comprises an image shift unit; and
said energy dispersion unit is controlled in linkage with a changed direction and an amount of deflection of said electron beam on said sample by said image shift means.
11. An electron beam apparatus according to claim 1 , wherein control of said energy dispersion unit is manually performed by operation of a knob arranged on an operation panel or by mouse operation of a pointer displayed on a screen.
12. An electron beam apparatus according to claim 1 , further comprising an adjusting unit for electrically adjusting a control condition of said energy dispersion unit so that said electron beam may not experience deflecting action by the control of said energy dispersion unit.
13. An electron beam apparatus according to claim 12 , wherein:
said adjusting unit comprises a unit for time-modulating a control value of said energy dispersion unit; and
a knob arranged on an operation panel or a mouse pointer for inputting said control condition.
14. An electron beam apparatus according to claim 1 , further comprising:
a unit for presetting a control condition of said energy dispersion unit to a plurality of different conditions;
capturing an image corresponding to said control conditions;
detecting positional shifts of the image caused by changing the control condition of said energy dispersion unit; and
setting the control condition of said energy dispersion unit based on said detected results.
15. An electron beam apparatus comprising:
an electron source for emitting an electron beam;
a focusing lens for focusing said electron beam;
an objective lens for generating a focusing field which focuses the electron beam on a sample; and
an image shift deflector for deflecting the electron beam by moving a field of view from an optical axis of the electron beam apparatus, making the electron beam pass through an intersection point of the optical axis with the focusing field, the image shift deflector further comprising:
an energy dispersion unit for generating an energy dispersion field which disperses energy of the electron beam; and
an energy dispersion control unit for adjusting the energy dispersion field according to distance amount of the field of view by the image shift deflector,
wherein the energy dispersion control unit adjusting a condition of the energy dispersion control unit adjusting a condition of the energy dispersion unit as the field of view does not move, when a condition of the dispersion unit changes periodically.
16. An electron beam apparatus according to claim 15 , wherein:
the energy dispersion unit comprises an E×B field generation unit; and
the E×B field contains an electric field and a magnetic field intersecting each other on the optical axis of the electron beam.
17. An electron beam apparatus according to claim 16 , wherein the energy dispersion control unit changes an applied voltage periodically for changing the formed electric field.
18. An electron beam apparatus according to claim 17 , wherein the energy dispersion unit comprises:
a first pair of coils for deflecting the electron beam toward X-direction;
a second pair of coils for deflecting the electron beam toward Y-direction;
a first pair of electrodes for deflecting the electron beam toward X-direction; and
a second pair of electrodes for deflecting the electron beam toward Y-direction.
19. An electron beam apparatus according to claim 18 , wherein:
the energy dispersion control unit calculates currents applied to the first pair of the coils and the second pair of the coils,
the voltages applied to the first pair of the electrodes and the second pair of the electrodes based on following formula, and
1 x= ( Kxx·Vx+Kxy·Vy )· Vaac −1/2
1 y= ( Kyx·Vx+Kyy·Vy )· Vaac −1/2 ,
wherein:
1 x : current applied to the first pair of the coils,
1 y : current applied to the second pair of the coils,
Vx: voltage applied to the first pair of the electrodes,
Vy: voltage applied to the second pair of the electrodes,
Kxx: coefficient of Vx,
Kxy: coefficient of Vy,
Kyx: coefficient of Vx,
Kyy: coefficient of Vy, and
Vacc: acceleration voltage of the electron beam.