A radiation image storage panel is composed of a phosphor layer formed by a gas phase-accumulation method and a transparent protective film glued thereon via an adhesive layer, in which the adhesive layer is made of a resin material having Tg of higher than 35° C. in an amount of 40 to 100 wt. % and a resin material having Tg of not higher than 35° C. in an amount of 60 to 0 wt. %.
1. A phosphor panel, comprising a phosphor layer formed by a gas phase-accumulation method and a transparent protective film glued thereon via an adhesive layer, wherein the adhesive layer comprises a resin material having a glass transition temperature higher than 35° C. in an amount of 40 to 100 wt. % and a resin material having a glass transition temperature not higher than 35° C. in an amount of 60 to 0 wt. %.
2. The phosphor panel of claim 1 , wherein the adhesive layer comprises a resin material having a glass transition temperature higher than 45° C. in an amount of 40 to 100 wt. % and a resin material having a glass transition temperature not higher than 25° C. in an amount of 60 to 0 wt. %.
3. The phosphor panel of claim 1 , wherein the adhesive layer has a thickness in the range of 0.1 to 10 μm.
4. The phosphor panel of claim 1 , wherein a stimulating ray-antireflection layer is provided on one surface of the transparent protective film.
5. The phosphor panel of claim 1 , wherein a moisture-proof layer of inorganic material having a moisture permeability of 1 g/m 2 ·day or less is provided on at least one surface of the transparent protective film.
6. The phosphor panel of claim 5 , wherein a stimulating ray-antireflection layer is provided on at least one surface of the moisture-proof layer.