IP Library Granted Patent US 7,394,201
Granted Patent B2
US 7,394,201 · App. 11/248,661 · Granted Jul 1, 2008

Field emission cathode gating for RF electron guns and planar focusing cathodes

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,394,201
App. No.
11/248,661
Granted
Jul 1, 2008
Kind
B2
Abstract

A novel method of gating electron emission from field-emitter cathodes for radio frequency (RF) electrode guns and a novel cathode that provides a focused electron beam without the need for magnetic fields or a curved cathode surface are provided. The phase and strength of a predefined harmonic field, such as the 3rd harmonic field, are adjusted relative to a fundamental field to cause a field emission cathode to emit electrons at predefined times for the generation of high-brightness electron beams. The emission time is gated responsive to the combined harmonic and fundamental fields and the response of the FE cathode to the combined fields. A planar focusing cathode includes a selected dielectric material, such as a ceramic material, to provide an electron beam emission surface. Metal surfaces are provided both radially around and behind the dielectric material to shape the electric fields that accelerate and guide the beam from the cathode surface.

Claims (10)

1. A planar focusing cathode for providing a focused electron beam comprising:

a selected dielectric material for providing an electron beam emission surface; said electron beam emission surface including a substantially flat surface;

a first metal surface behind said dielectric material;

a second metal surface radially surrounding said dielectric material; said first metal surface and said second metal surface for shaping electric fields that accelerate and guide an electron beam from the electron beam emission surface;

said dielectric material being penetrated by electric fields and allowing the planar focusing cathode to provide focusing of said electron beam starting at said substantially flat surface of the cathode dielectric material.

2. A planar focusing cathode as recited in claim 1 wherein said first metal surface is slidingly received in a cavity behind said dielectric material and is positioned to provide focusing of said electron beam.

3. A planar focusing cathode as recited in claim 1 wherein selected dielectric material includes a ceramic material.

4. A planar focusing cathode as recited in claim 1 wherein selected dielectric material functions as a cathode of a high brightness RF electron gun.

5. A planar focusing cathode as recited in claim 1 wherein selected dielectric material provides focusing of said electron beam, and the need for magnetic lenses including solenoids between an electron gun and a following accelerator section are eliminated.

6. A planar focusing cathode as recited in claim 1 wherein selected dielectric material provides focusing of said electron beam, and the need for a curved cathode surface is eliminated.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2006
From: UNIVERSITY OF CHICAGO, THE
To: U CHICAGO ARGONNE LLC
Reel/Frame 018385/0618 →
CONFIRMATORY LICENSE Recorded Feb 3, 2006
From: CHICAGO, THE UNIVERSITY OF
To: ENERGY, UNITED STATES DEPARTMENT OF
Reel/Frame 017598/0330 →