Display and method for fabricating the same

1 . A display, comprising:

a display part formed on a substrate;

a sealing member that seals the display part;

a hydrophobic insulation film that covers the substrate and the sealing member; and

an adhesion reinforcement layer interposed between the substrate and the hydrophobic insulation film, and between the sealing member and the hydrophobic insulation film.

2 . The display of claim 1 ,

wherein the adhesion reinforcement layer modifies a surface of the substrate.

3 . The display of claim 1 ,

wherein the adhesion reinforcement layer covers about 30% to about 100% of the surface of the substrate.

4 . The display of claim 1 ,

wherein the adhesion reinforcement layer comprises a silane or a silazane.

5 . The display of claim 4 ,

wherein the silane is represented by the following chemical structure

wherein R 1 is selected from the group consisting of a hydroxyl group, a halogen group, a linear alkoxy group having 1 to 6 carbon atoms, and a branched alkoxy group having 1 to 6 carbon atoms,

wherein R 2 and R 3 are each selected from the group consisting of a hydroxyl group, a halogen group, a linear alkoxy group having 1 to 6 carbon atoms, a branched alkoxy group having 1 to 6 carbon atoms, a linear alkyl group having 1 to 22 carbon atoms, a branched alkyl group having 1 to 22 carbon atoms, a cyclic alkyl group having 3 to 7 carbon atoms, a phenyl group, a naphthyl group, and a chlorophenyl group, and

wherein R 4 is selected from the group consisting of a linear alkyl group having 1 to 22 carbon atoms, a branched alkyl group having 1 to 22 carbon atoms, a cyclic alkyl group having 3 to 7 carbon atoms, a phenyl group, a naphthyl group and a chlorophenyl group.

6 . The display of claim 4 ,

wherein the silazane is represented by the following chemical structure

wherein R 1 and R 2 are each selected from the group consisting of an alkyl group having hydrogen or 1 to 18 carbon atoms, a phenyl group, and a vinyl group, and

wherein R 3 is one selected from the group consisting of an alkyl group having hydrogen or 1 to 18 carbon atoms, a cyclic alkyl group having 2 or 3 carbon atoms, a phenyl group, and a vinyl group.

7 . The display of claim 1 ,

wherein the hydrophobic insulation film is a parylene film.

8 . The display of claim 7 ,

wherein the parylene film is represented by the following chemical structure

wherein R 1 and R 2 are each hydrogen or a halogen,

wherein and X 1 and X 2 are each selected from the group consisting of hydrogen, halogen, trifluromethyl (CF 3 ), amine group (NH 2 ) and aminomethyl (CH 2 NH 3 ).

9 . The display of claim 1 , further comprising:

a pad part for coupling the display part and an external circuit module and

a connector for coupling the pad part and the external circuit module.

10 . The display of claim 8 ,

wherein the hydrophobic insulation film covers at least parts of the pad part and the connector.

11 . The display of claim 1 ,

wherein the display part comprises an organic electroluminescent display or a liquid crystal display.

12 . A method for fabricating a display, comprising:

forming a display part on a substrate;

sealing the display part with a sealing member;

forming an adhesion reinforcement layer to cover the substrate and the sealing member; and

forming a hydrophobic insulation film on the adhesion reinforcement layer.

13 . The method of claim 12 ,

wherein the adhesion reinforcement layer comprises a material that modifies a surface of the substrate.

14 . The method of claim 13 ,

wherein the adhesion reinforcement layer covers about 30% to about 100% of the surface of the substrate.

15 . The method of claim 13 ,

wherein the adhesion reinforcement layer comprises a silane or a silazane.

16 . The method of claim 15 ,

wherein the adhesion reinforcement layer is formed by vapor deposition.

17 . The method of claim 15 ,

wherein the adhesion reinforcement layer cured at a temperature of 150° C. or less.

18 . The method of claim 12 ,

wherein the hydrophobic insulation film comprises parylene.

19 . The method of claim 18 ,

wherein the parylene film is formed by vapor deposition.

20 . The method of claim 19 ,

wherein the parylene film is formed on a substrate at a temperature of about 10° C. to about 120° C.