Electronic interconnects and methods of making same

1. A method for making an interconnect, comprising:

depositing a conductive layer on a substrate;

depositing an oxidation protective layer on the conductive layer;

patterning the oxidation protective layer to form openings to the conductive layer;

depositing contact pads on the conductive layer through the openings in the oxidation protective layer, the contact pads comprising a conductive material; and

patterning the conductive layer and the oxidation protective layer to form electrical traces on the substrate, wherein the conductive layer includes the contact pads deposited thereon.

2. The method of claim 1 , wherein the oxidation protective layer comprises one of titanium, tungsten, nickel, molybdenum, chromium, a nickel alloy, or combinations thereof.

3. The method of claim 1 , wherein the oxidation protective layer comprises a plurality of layers.

4. The method of claim 1 , wherein the substrate comprises a flexible material.

5. The method of claim 1 , further comprising depositing an adhesion promoting coating on the substrate prior to depositing the conductive layer.

6. The method of claim 5 , wherein the adhesion promoting layer comprises titanium, nickel, molybdenum, chromium, tungsten, a nickel alloy, or combinations thereof.

7. The method of claim 1 , wherein the step of depositing the contact pads does not employ bus plating.

8. The method of claim 1 , wherein the step of depositing the contact pads comprises:

disposing a mask over the conductive layer to expose contact pad locations of the conductive layer;

etching the oxidation protective layer from the contact pad locations to deposit the contact pads; and

depositing a conductive material on the contact pad locations to form the contact pads.

9. The method of claim 8 , wherein the step of depositing the conductive material comprises:

depositing a first layer comprising a first material on the conductive layer; and

depositing a second layer comprising a second material on the first layer, wherein the second layer comprises a noble metal.

10. The method of claim 9 , wherein the first material comprises nickel and wherein the second material comprises gold, or palladium, or both.

11. The method of claim 1 , wherein the step of patterning the conductive layer and the oxidation protective layer comprises:

disposing a mask on the oxidation protective layer to provide openings to the protective layer; and

removing portions of the conductive layer and the oxidation protective layer to form electrical traces on the substrate.

12. A method for making an interconnect, comprising:

providing a substrate having a first surface and a second surface;

depositing conductive layers on each of the first and second surfaces of the substrate;

depositing oxidation protective layers on each of the conductive layers;

patterning the oxidation protective layers to form openings to the conductive layers;

depositing contact pads on each of the conductive layers through the openings in the oxidation protective layers, the contact pads comprising a conductive material; and

patterning each of the conductive layers to form electrical traces on each of the first and second surfaces of the substrate, wherein each of the conductive layers comprises the contact pads deposited thereon.

13. The method of claim 12 , further comprising forming an opening in the substrate, wherein the opening extends through a thickness of the substrate.