IP Library Granted Patent US 7,311,781
Granted Patent B2
US 7,311,781 · App. 11/256,976 · Granted Dec 25, 2007

Substrate rotation type treatment apparatus

Assignee: Dainippon Screen MGF, Co., Ltd
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Quick Facts
Patent No.
US 7,311,781
App. No.
11/256,976
Granted
Dec 25, 2007
Kind
B2
Abstract

An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a long time, or a thin film comes off from an inside wall surface to be contamination-causing substances even if the cup made of a water-repellent material for collecting a treatment liquid becomes hydrophilic. A cup 16 disposed to surround the sides and underside of a substrate W rotating while being held by a spin chuck 10 , and serving to collect a treatment liquid diffused from the substrate to the surroundings, is made of a plastic material. Further, an inside wall surface of an upper-side cup part 24 of the cup 16 , being a portion on which the treatment liquid having been diffused from the substrate impinges, is roughened to be a hydrophilic surface.

Claims (14)

1. A substrate rotation type treatment apparatus causing a substrate to rotate to make substrate treatment comprising:

substrate holding means for holding the substrate in a horizontal posture;

substrate rotation means for causing the substrate that is held by said substrate holding means to rotate about a vertical axis;

treatment liquid supply means for supplying a treatment liquid to a surface of the substrate held by said substrate holding means; and

a cup having a container shape of which top is open, which is disposed so as to surround the sides and the under side of the substrate held by said substrate holding means, and which serves to collect a treatment liquid to be diffused from the substrate to the surroundings;

wherein said cup is made of polyvinyl chloride, and at least a portion of an inside wall surface of said cup on which a treatment liquid having been diffused from the substrate to the surroundings impinges is roughened to be a hydrophilic surface by plasma treatment so that a contact angle is not more than 10°.

2. A substrate rotation type treatment apparatus causing a substrate to rotate to make substrate treatment comprising:

substrate holding means for holding the substrate in a horizontal posture;

substrate rotation means for causing the substrate that is held by said substrate holding means to rotate about a vertical axis;

treatment liquid supply means for supplying a treatment liquid to a surface of the substrate held by said substrate holding means; and

a cup having a container shape of which top is open, which is disposed so as to surround the sides and the under side of the substrate held by said substrate holding means, and which serves to collect a treatment liquid to be diffused from the substrate to the surroundings;

wherein said cup is made of a plastic material, and at least a portion of an inside wall surface of said cup on which a treatment liquid having been diffused from the substrate to the surroundings impinges is roughened to be a hydrophilic surface; and wherein there are mixed hydrophilic surface and hydrophobic surface at least at the portion of the inside wall surface of said cup on which a treatment liquid having been diffused from the surface to the surroundings impinges.

3. The substrate rotation type treatment apparatus according to claim 2 , wherein there are mixed hydrophilic surface and hydrophobic surface in a striped pattern horizontally extended.

4. The substrate rotation type treatment apparatus according to claim 2 , wherein there are mixed hydrophilic surface and hydrophobic surface in a checkered pattern.

Assignments (2)
CHANGE OF NAME Recorded Feb 24, 2015
From: DAINIPPON SCREEN MFG. CO., LTD.
To: SCREEN HOLDINGS CO., LTD.
Reel/Frame 035071/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 25, 2005
From: TOKURI, KENTARO; MORINISHI, KENYA; IWAMI, MASAKI
To: DAINIPPON SCREEN MFG, CO., LTD
Reel/Frame 017146/0320 →
Priority Claims (2)
JP 2004-332624 · Nov 17, 2004 · national
JP 2004-332625 · Nov 17, 2004 · national
Continuity (1)
Related Publication 20060102069A1 · May 18, 2006