Process for treating an aqueous system with chlorine dioxide
View Patent ↗This invention relates to an automated process for efficiently treating an aqueous system with chlorine dioxide. The process results in high efficiency yields of chlorine dioxide on a continuous basis by minimizing the waste of precursor chemicals. Additionally, the process creates less environmental stress because the formation of unwanted by-products is minimized. The level of chlorine dioxide in the aqueous system treated and other parameters of the process are monitored and adjusted automatically to maintain them within acceptable levels.
1. An automated process for treating a contaminated aqueous system with an aqueous solution of chlorine dioxide generated by a chlorine dioxide generator having a reaction chamber, wherein contaminated water enters the chlorine dioxide generator and is motive dilution water for precursor chemicals that are reacted in the reaction chamber of said chlorine dioxide generator, such that said motive water exits the chlorine dioxide generator as an aqueous solution of chlorine dioxide, which is fed into the contaminated aqueous system to be treated, wherein said process comprises:
(a) pre-selecting:
(1) a concentration of chlorine dioxide for the aqueous solution of chlorine dioxide exiting from the reaction chamber of the chlorine dioxide generator, and
(2) a generation efficiency for the chlorine dioxide generator;
(b) monitoring:
(1) a total system water demand of the contaminated motive dilution water entering the chlorine dioxide generator;
(2) the pH of the aqueous solution of chlorine dioxide exiting the reaction chamber of the chlorine dioxide generator,
(3) the amounts of precursor chemicals,
(4) the concentration of chlorine dioxide in the aqueous solution exiting from the reaction chamber of the chlorine dioxide generator, and
(5) the generation efficiency of chlorine dioxide generator;
(c) calculating:
(1) the total chlorine dioxide demand needed for the contaminated motive dilution water entering the chlorine dioxide generator in order to obtain the pre-selected concentration of chlorine dioxide in the aqueous solution of chlorine dioxide exiting the reaction chamber, and
(2) the amount of precursor chemicals needed to treat the contaminated motive dilution water entering the reaction chamber of the chlorine dioxide generator in order to obtain said pre-selected concentration of chlorine dioxide in the aqueous solution of chlorine dioxide exiting the reaction chamber of the chlorine dioxide generator;
(d) adjusting the amounts of precursor chemicals to maintain:
(1) a pH of 2.0 to 3.0 for the aqueous solution of chlorine dioxide exiting the reaction chamber of the generator,
(2) the pre-selected concentration of chlorine dioxide in the aqueous solution of chlorine dioxide exiting the reaction chamber of the chlorine dioxide generator, and
(3) the pre-selected generation efficiency of the chlorine dioxide generator;
(e) feeding the aqueous solution of chlorine dioxide exiting from the chlorine dioxide reaction chamber into said contaminated aqueous system,
wherein the steps of said process are automatically carried out by a Programmable Logic Controller (PLC) containing a mass flow feed forward algorithm that automatically regulates the amounts of the precursor chemicals pumped into reaction chamber and a feed back algorithm that regulates the concentration of chlorine dioxide in the aqueous solution of chlorine dioxide generated.
2. The process of claim 1 wherein the precursor chemicals are sodium chlorite, sodium hypochlorite, and hydrochloric acid.
3. The process of claim 2 wherein the PLC continuously:
(a) monitors the chlorine dioxide concentration in the aqueous solution of chlorine dioxide exiting the chlorine dioxide generator reaction chamber,
(b) compares the chlorine dioxide concentration in the aqueous solution of chlorine dioxide exiting the chlorine dioxide generator reaction chamber to the pre-selected concentration for the chlorine dioxide in the aqueous solution of chlorine dioxide exiting the chlorine dioxide generator reaction chamber, and
(c) adjusts the amounts of the precursor chemicals as follows:
(1) if the chlorine dioxide generation efficiency is less than theoretical efficiency selected, then the sodium hypochlorite pumping rate is increased in a stepwise fashion;
(2) if the chlorine dioxide generation efficiency is higher than the theoretical efficiency selected, then the sodium chlorite pumping rate is reduced in a stepwise fashion;
(3) if the chlorine dioxide generation efficiency is in the desired range, then no further changes are made.
4. The process of claim 3 wherein the pre-selected concentration of chlorine dioxide in the aqueous solution generated, the generation efficiency of chlorine dioxide, and the concentration of chlorine dioxide in the aqueous system to be treated are ranges.
5. The process of claim 4 wherein the generation efficiency of the chlorine dioxide generator is at least 90 percent.
6. The process of claim 5 wherein an optical sensor is used to detect the concentration of chlorine dioxide in the aqueous solution of chlorine dioxide and the optical sensor sends a signal to the PLC, which reflects the concentration of chlorine dioxide in the aqueous system of chlorine dioxide exiting the reaction chamber of the chlorine dioxide generator.
7. The process of claim 6 further comprising determining the flow rate of the motive dilution water to be treated.
8. The process of claim 7 wherein the concentration of chlorine dioxide in the aqueous solution of chlorine dioxide exiting the reaction chamber is below the solubility limit of chlorine dioxide in water.
9. The process of claim 8 wherein the mole ratio of sodium chlorite to sodium hypochlorite is from about 2.0 to about 1.0, and the mole ratio of sodium chlorite to hydrochloric acid in the reaction chamber is from about 1.0 to about 2.0.
10. The process of claim 9 wherein the concentration of chlorine dioxide in the aqueous solution exiting the reaction chamber is from 100 mg/l to 2,900 mg/l at 20° C. and 30 mm partial pressure.