IP Library Granted Patent US 7,271,670
Granted Patent B2
US 7,271,670 · App. 11/270,597 · Granted Sep 18, 2007

CR oscillation circuit

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Quick Facts
Patent No.
US 7,271,670
App. No.
11/270,597
Granted
Sep 18, 2007
Kind
B2
Abstract

A CR oscillation circuit comprises first and second logic elements, a capacitive element, and a resistive element. The first logic element is connected between a first node and a second node. The second logic element is connected between the second node and a third node. The capacitive element is connected between the first node and the second node. The resistive element is connected between the first node and the third node. The capacitive element includes a well, a diffusion layer, a gate electrode and a gate oxide film. The capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in a supply voltage. The capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage.

Claims (106)

1. A CR oscillation circuit comprising:

a first logic element having an input terminal connected to a first node and an output terminal connected to a second node;

a second logic element having an input terminal connected to the second node and an output terminal connected to a third node;

a capacitive element connected between the first node and the second node in parallel with the first logic element; and

a resistive element connected between the first node and the third node in parallel with the first and second logic elements,

wherein the capacitive element includes

a well formed in a semiconductor substrate,

a diffusion layer formed in the well, the diffusion layer being electrically connected to any one of the first node and the second node,

a gate electrode formed on the well and the diffusion layer, the gate electrode being electrically connected to the other one of the first node and the second node, and

a gate oxide film formed between the well and the gate electrode,

each of the first and second logic elements has a voltage-dependence characteristic such that its on-resistance varies according to a variation in a supply voltage,

the capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in the supply voltage, and

a capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage, and

wherein a variation amount of the capacitance value of the capacitive element which is determined according to a variation amount of the supply voltage is increased or decreased by forming at least one opening in the gate electrode.

2. A CR oscillation circuit comprising:

a first logic element having an input terminal connected to a first node and an output terminal connected to a second node;

a second logic element having an input terminal connected to the second node and an output terminal connected to a third node;

a capacitive element connected between the first node and the second node in parallel with the first logic element; and

a resistive element connected between the first node and the third node in parallel with the first and second logic elements,

wherein the capacitive element includes

a well formed in a semiconductor substrate,

a diffusion layer formed in the well, the diffusion layer being electrically connected to any one of the first node and the second node,

a gate electrode formed on the well and the diffusion layer, the gate electrode being electrically connected to the other one of the first node and the second node, and

a gate oxide film formed between the well and the gate electrode,

each of the first and second logic elements has a voltage-dependence characteristic such that its on-resistance varies according to a variation in a supply voltage,

the capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in the supply voltage, and

a capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage, and

wherein:

the gate electrode is formed by a plurality of electrodes; and

a variation amount of the capacitance value of the capacitive element which is determined according to a variation amount of the supply voltage is increased or decreased by adjusting the number of said plurality of electrodes.

3. A CR oscillation circuit comprising:

a first logic element having an input terminal connected to a first node and an output terminal connected to a second node;

a second logic element having an input terminal connected to the second node and an output terminal connected to a third node;

a capacitive element connected between the first node and the second node in parallel with the first logic element; and

a resistive element connected between the first node and the third node in parallel with the first and second logic elements,

wherein the capacitive element includes

a well formed in a semiconductor substrate,

a diffusion layer formed in the well, the diffusion layer being electrically connected to any one of the first node and the second node,

a gate electrode formed on the well and the diffusion layer, the gate electrode being electrically connected to the other one of the first node and the second node, and

a gate wide film formed between the well and the gate electrode,

each of the first and second logic elements has a voltage-dependence characteristic such that its on-resistance varies according to a variation in a supply voltage,

the capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in the supply voltage, and

a capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage, and

wherein the capacitive element further includes:

a potential-fixed diffusion layer formed in the semiconductor substrate; and

a resistive element connected between the potential-fixed diffusion layer and a predetermined fixed potential.

4. A CR oscillation circuit, comprising:

a first logic element having an input terminal connected to a first node and an output terminal connected to a second node;

a second logic element having an input terminal connected to the second node and an output terminal connected to a third node;

a capacitive element connected between the first node and the second node in parallel with the first logic element; and

a resistive element connected between the first node and the third node in parallel with the first and second logic elements,

wherein the resistive element includes a diffused resistor formed in a semiconductor substrate, the diffused resistor being electrically connected to each of the first node and the third node,

each of the first and second logic elements has a voltage-dependence characteristic such that its on-resistance varies according to a variation in a supply voltage,

the resistive element has a voltage-dependence characteristic such that its resistance value varies according to the variation in the supply voltage, and

a resistance value of the resistive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage, and

wherein:

the resistive element further includes a resistor which has a voltage-dependence characteristic such that its resistive value varies according to the variation in the supply voltage; and

a resistance value of the resistor decreases when a resistance value of the diffused resistor increases according to the variation in the supply voltage.

5. The CR oscillation circuit of claim 4 , wherein:

the capacitive element includes:

a well formed in the semiconductor substrate,

a diffusion layer formed in the well, the diffusion layer being electrically connected to any one of the first node and the second node,

a gate electrode formed on the well and the diffusion layer, the gate electrode being electrically connected to the other one of the first node and the second node, and

a gate oxide film formed between the well and the gate electrode;

wherein:

the capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in the supply voltage; and

a capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage.

6. A CR oscillation circuit, comprising:

a first logic element having an input terminal connected to a first node and an output terminal connected to a second node;

a second logic element having an input terminal connected to the second node and an output terminal connected to a third node;

a capacitive element connected between the first node and the second node in parallel with the first logic element; and

a resistive element connected between the first node and the third node in parallel with the first and second logic elements,

wherein the resistive element includes a diffused resistor formed in a semiconductor substrate, the diffused resistor being electrically connected to each of the first node and the thin node,

each of the first and second logic elements has a temperature-dependence characteristic such that its on-resistance varies according to a temperature variation,

the resistive element has a temperature-dependence characteristic such that its resistance value varies according to the temperature variation, and

a resistance value of the resistive element decreases when the on-resistance of the first and second logic elements increases according to the temperature variation, and

wherein:

the resistive element further includes a resistor which has a temperature-dependence characteristic such that its resistive value varies according to the temperature variation; and

a resistance value of the resistor decreases when a resistance value of the diffused resistor increases according to the temperature variation.

7. The CR oscillation circuit of claim 6 , wherein:

the capacitive element includes:

a well formed in the semiconductor substrate,

a diffusion layer formed in the well, the diffusion layer being electrically connected to any one of the first node and the second node,

a gate electrode formed on the well and the diffusion layer, the gate electrode being electrically connected to the other one of the first node and the second node, and

a gate oxide film formed between the well and the gate electrode;

each of the first and second logic elements has a voltage-dependence characteristic such that its on-resistance varies according to a variation in a supply voltage;

the capacitive element has a voltage-dependence characteristic such that its capacitance value varies according to the variation in the supply voltage; and

a capacitance value of the capacitive element decreases when the on-resistance of the first and second logic elements increases according to the variation in the supply voltage.

8. The CR oscillation circuit of claim 4 , wherein the diffused resistor is a P-type or N-type diffusion layer formed in the semiconductor substrate.

9. The CR oscillation circuit of claim 4 , wherein the diffused resistor is a P-type or N-type well formed in the semiconductor substrate.

10. The CR oscillation circuit of claim 1 , further comprising:

a P-type MOS transistor connected between a power supply node and a fourth node, the fourth node existing between the first node and an input of the first logic circuit, a source and a gate of the P-type MOS transistor being connected to each other; and

an N-type MOS transistor connected between the fourth node and a ground node, a source and a gate of the N-type MOS transistor being connected to each other.

11. The CR oscillation circuit of claim 6 , wherein the diffused resistor is a P-type or N-type diffusion layer formed in the semiconductor substrate.

12. The CR oscillation circuit of claim 6 , wherein the diffused resistor is a P-type or N-type well formed in the semiconductor substrate.

13. The CR oscillation circuit of claim 4 , further comprising:

a P-type MOS transistor connected between a power supply node and a fourth node, the fourth node existing between the first node and an input of the first logic circuit, a source and a gate of the P-type MOS transistor being connected to each other; and

an N-type MOS transistor connected between the fourth node and a ground node, a source and a gate of the N-type MOS transistor being connected to each other.

14. The CR oscillation circuit of claim 6 , further comprising:

a P-type MOS transistor connected between a power supply node and a fourth node, the fourth node existing between the first node and an input of the first logic circuit, a source and a gate of the P-type MOS transistor being connected to each other; and

an N-type MOS transistor connected between the fourth node and a ground node, a source and a gate of the N-type MOS transistor being connected to each other.

15. The CR oscillation circuit of claim 2 , further comprising:

a P-type MOS transistor connected between a power supply node and a fourth node, the fourth node existing between the first node and an input of the first logic circuit, a source and a gate of the P-type MOS transistor being connected to each other; and

an N-type MOS transistor connected between the fourth node and a ground node, a source and a gate of the N-type MOS transistor being connected to each other.

16. The CR oscillation circuit of claim 1 , wherein the resistive element is a P-type or N-type well formed in the semiconductor substrate.

17. The CR oscillation circuit of claim 2 , wherein the resistive element is a P-type or N-type well formed in the semiconductor substrate.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 26, 2014
From: PANASONIC CORPORATION
To: COLLABO INNOVATIONS, INC.
Reel/Frame 033021/0806 →
LIEN Recorded Jan 13, 2014
From: COLLABO INNOVATIONS, INC.
To: PANASONIC CORPORATION
Reel/Frame 031997/0445 →
CHANGE OF NAME Recorded Jan 8, 2014
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 031947/0358 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2006
From: NISHI, KAZUYOSHI; TAKIGUCHI, JUNJI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 017284/0011 →